Prof. John G. Ekerdt Profile

Prof. John G. Ekerdt

at Univ of Texas at Austin

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 24 February 2017 Presentation + Paper

Monolithic integration of metal-ferroelectric-semiconductor heterostructure using atomic layer deposition

Edward Lin, Shen Hu, John Ekerdt

Proceedings Volume 10105, 1010519 (2017) https://doi.org/10.1117/12.2254196

KEYWORDS: Perovskite, Atomic layer deposition, Silicon, Germanium, Semiconductors, Oxides, Functional oxides, Heteroepitaxy, Annealing, Lanthanum, Oxygen, Crystals

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Proceedings Article | 16 March 2016 Paper

Rapid recipe formulation for plasma etching of new materials

Meghali Chopra, Zizhuo Zhang, John Ekerdt, Roger Bonnecaze

Proceedings Volume 9781, 978111 (2016) https://doi.org/10.1117/12.2219171

KEYWORDS: Etching, Plasma, Data modeling, Plasma etching, Dry etching, Magnesium, Oxides, Chemistry, Optimization (mathematics), Bayesian inference, Calibration, Ions, Autoregressive models, Electrons, Statistical modeling

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Proceedings Article | 8 March 2014 Paper

Growth of crystalline LaAlO3 by atomic layer deposition

Thong Ngo, Martin McDaniel, Agham Posadas, Alexander Demkov, John Ekerdt

Proceedings Volume 8987, 898712 (2014) https://doi.org/10.1117/12.2045532

KEYWORDS: Crystals, Atomic layer deposition, Annealing, Lanthanum, Interfaces, Silicon, X-rays, Aluminum, X-ray diffraction, Diffraction

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SPIE Journal Paper | 1 July 2008

Role of surfactants in adhesion reduction for step and flash imprint lithography

Michael Lin, Daniel Hellebusch, Kai Wu, Eui Kim, Kuan-Hsun Lu, Kenneth Liechti, John Ekerdt, Paul Ho, C. Grant Willson

JM3, Vol. 7, Issue 03, 033005, (July 2008) https://doi.org/10.1117/12.10.1117/1.2968269

KEYWORDS: Polymers, Interfaces, Quartz, Adhesives, Etching, Liquids, Silicon, Lithography, Mechanics, Natural surfaces

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Proceedings Article | 20 March 2008 Paper

Interfacial adhesion studies for step and flash imprint lithography

Michael Lin, Daniel Hellebusch, Kai Wu, Eui Kyoon Kim, Kuan Lu, Li Tao, Kenneth Liechti, John Ekerdt, Paul Ho, Walter Hu, C. Grant Willson

Proceedings Volume 6921, 69210E (2008) https://doi.org/10.1117/12.772797

KEYWORDS: Polymers, Quartz, Interfaces, Etching, Mechanics, Lithography, Liquids, Adhesives, Silicon, Polymer thin films

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Proceedings Article | 16 June 2003 Open Access

Imprint lithography: lab curiosity or the real NGL

Douglas Resnick, William Dauksher, David Mancini, Kevin Nordquist, Todd Bailey, Stephen Johnson, Nicholas Stacey, John Ekerdt, C. Grant Willson, S. Sreenivasan, Norman Schumaker

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490126

KEYWORDS: Etching, Lithography, Semiconducting wafers, Silicon, Nanoimprint lithography, Chromium, Optical alignment, Image processing, Oxides, Inspection

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Proceedings Article | 16 June 2003 Paper

Employing Step and Flash imprint lithography for gate-level patterning of a MOSFET device

Britain Smith, Nicholas Stacey, J. Donnelly, David Onsongo, Todd Bailey, Chris Mackay, Douglas Resnick, William Dauksher, David Mancini, Kevin Nordquist, S. Sreenivasan, Sanjay Banerjee, John Ekerdt, Grant Willson

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490142

KEYWORDS: Etching, Lithography, Field effect transistors, Optical alignment, Semiconducting wafers, Optical lithography, Photomasks, Oxides, Reactive ion etching, Halogens

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Proceedings Article | 16 June 2003 Paper

Advances in Step and Flash imprint lithography

Stephen Johnson, Todd Bailey, Michael Dickey, Britain Smith, Eunha Kim, Andrew Jamieson, Nicholas Stacey, John Ekerdt, C. Grant Willson, David Mancini, William Dauksher, Kevin Nordquist, Douglas Resnick

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484985

KEYWORDS: Etching, Oxygen, Lithography, Polymerization, Silicon, Data modeling, Semiconducting wafers, Statistical analysis, Inspection, Materials processing

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SPIE Journal Paper | 1 October 2002

High resolution templates for step and flash imprint lithography

Douglas Resnick, William Dauksher, David Mancini, Kevin Nordquist, Eric Ainley, Kathleen Gehoski, Jeff Baker, Todd Bailey, B. Choi, Stephen Johnson, S. Sreenivasan, John Ekerdt, C. Grant Willson

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1508410

KEYWORDS: Lithography, Scanning electron microscopy, Glasses, Printing, Overlay metrology, Distortion, Chromium, Photomasks, Solids, Defect inspection

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Proceedings Article | 24 July 2002 Paper

New methods for fabricating step and flash imprint lithography templates

Douglas Resnick, Todd Bailey, David Mancini, Kevin Nordquist, William Dauksher, Eric Ainley, A. Talin, Kathleen Gehoski, Jeff Baker, Byung Choi, Stephen Johnson, Matthew Colburn, Mario Meissl, S. Sreenivasan, John Ekerdt, C. Grant Willson

Proceedings Volume 4608, (2002) https://doi.org/10.1117/12.437269

KEYWORDS: Etching, Chromium, Oxides, Semiconducting wafers, Quartz, Glasses, Scanning electron microscopy, Lithography, Printing, Photomasks

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Proceedings Article | 1 July 2002 Paper

High-resolution templates for step and flash imprint lithography

Douglas Resnick, William Dauksher, David Mancini, Kevin Nordquist, Eric Ainley, Kathleen Gehoski, Jeff Baker, Todd Bailey, Byung Choi, Stephen Johnson, S. Sreenivasan, John Ekerdt, C. Grant Willson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472293

KEYWORDS: Etching, Quartz, Chromium, Scanning electron microscopy, Photomasks, Semiconducting wafers, Glasses, Lithography, Printing, Oxides

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Proceedings Article | 20 August 2001 Paper

Layer-to-layer alignment for step and flash imprint lithography

Byung Choi, Mario Meissl, Matthew Colburn, Todd Bailey, Paul Ruchhoeft, S. Sreenivasan, F. Prins, Sanjay Banerjee, John Ekerdt, C. Grant Willson

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436662

KEYWORDS: Optical alignment, Photomasks, Lithography, Semiconducting wafers, Overlay metrology, Liquids, Optical lithography, Ultraviolet radiation, Microscopes, Projection lithography

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Proceedings Article | 21 July 2000 Paper

Step and flash imprint lithography for sub-100-nm patterning

Matthew Colburn, Annette Grot, Marie Amistoso, Byung Choi, Todd Bailey, John Ekerdt, S. Sreenivasan, James Hollenhorst, C. Grant Willson

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390082

KEYWORDS: Etching, Lithography, Optical lithography, Reactive ion etching, Silicon, Metals, Polymethylmethacrylate, Halogens, Semiconducting wafers, Ultraviolet radiation

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Proceedings Article | 25 June 1999 Paper

Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen Johnson, Michael Stewart, S. Damle, Todd Bailey, Bernard Choi, M. Wedlake, Timothy Michaelson, S. Sreenivasan, John Ekerdt, C. Grant Willson

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351155

KEYWORDS: Etching, Semiconducting wafers, Lithography, Silicon, Photomasks, Quartz, Ultraviolet radiation, Liquids, Interfaces, Chromium

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Proceedings Article | 30 April 1998 Paper

New directions in surface spectroscopy enabled by ultrafast lasers

P. Wilson, Yun-Shik Lee, Y. Jiang, D. Lim, R. Kempf, R. Bungener, X. Hu, Jerry Dadap, Mark Anderson, M. ter Beek, Z. Xu, N. Russell, John Ekerdt, P. Parkinson, E. Mishina, Oleg Aktsipetrov, Michael Downer

Proceedings Volume 3272, (1998) https://doi.org/10.1117/12.307114

KEYWORDS: Second-harmonic generation, Spectroscopy, Interfaces, Polarization, Silicon, Hydrogen, Spectroscopes, Femtosecond phenomena, Harmonic generation, Ultrafast lasers

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Proceedings Article | 14 September 1994 Paper

Ex-situ and in-situ probing of Column IV interfaces using optical second harmonic generation

Jerry Dadap, N. Russell, X. Hu, John Ekerdt, Michael Downer, Bruce Doris, John Lowell, Alain Diebold

Proceedings Volume 2337, (1994) https://doi.org/10.1117/12.186652

KEYWORDS: Silicon, Interfaces, Second-harmonic generation, Atomic force microscopy, Polarization, Femtosecond phenomena, Chemical vapor deposition, Focus stacking software, Oxides, Data acquisition

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Showing 5 of 16 publications

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