Dr. John Kramar Profile

Dr. John Kramar

at NIST

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Publications (6)

Proceedings Article | 8 March 2016 Paper

Optimizing noise for defect analysis with through-focus scanning optical microscopy

Ravikiran Attota, John Kramar

Proceedings Volume 9778, 977811 (2016) https://doi.org/10.1117/12.2220679

KEYWORDS: Optical microscopy, Process control, Signal processing, Defect detection, Shape analysis, Nanotechnology, 3D acquisition, Optical microscopes, Cameras, Smoothing, Silicon, Image processing, Metrology

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Proceedings Article | 20 April 2011 Paper

TSOM method for semiconductor metrology

Ravikiran Attota, Ronald Dixson, John Kramar, James Potzick, András Vladár, Benjamin Bunday, Erik Novak, Andrew Rudack

Proceedings Volume 7971, 79710T (2011) https://doi.org/10.1117/12.881620

KEYWORDS: Silicon, Overlay metrology, Scanning electron microscopy, Optical microscopes, Metrology, 3D acquisition, 3D metrology, Polarization, 3D modeling, Photomasks

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Proceedings Article | 28 September 2007 Paper

The helium ion microscope: a new tool for nanomanufacturing

Michael Postek, Andras Vladár, John Kramar, Lewis Stern, John Notte, Sean McVey

Proceedings Volume 6648, 664806 (2007) https://doi.org/10.1117/12.742312

KEYWORDS: Scanning electron microscopy, Helium, Ions, Ion beams, Scanning helium ion microscopy, Nanotechnology, Electron beams, Electron microscopes, Gold, Carbon nanotubes

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Proceedings Article | 10 May 2005 Paper

Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing

Jon Pratt, John Kramar, David Newell, Douglas Smith

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.607339

KEYWORDS: Calibration, Standards development, Metrology, Atomic force microscopy, Electrodes, Control systems, Sensors, Interferometers, Process control, Capacitance

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Proceedings Article | 30 November 1999 Paper

Grating pitch measurements with the molecular measuring machine

John Kramar, Jau-Shi Jun, William Penzes, Fredric Scire, E. Clayton Teague, John Villarrubia

Proceedings Volume 3806, (1999) https://doi.org/10.1117/12.371144

KEYWORDS: Motion measurement, Metrology, Interferometers, Scanning tunneling microscopy, Chromium, Standards development, Distance measurement, Actuators, Vibration isolation, Optical alignment

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Proceedings Article | 14 June 1999 Paper

Toward nanometer accuracy measurements

John Kramar, Edward Amatucci, David Gilsinn, Jau-Shi Jun, William Penzes, Fredric Scire, E. Clayton Teague, John Villarrubia

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350791

KEYWORDS: Interferometers, Metrology, Scanning tunneling microscopy, Motion measurement, Digital signal processing, Control systems, Temperature metrology, Chromium, Actuators, Data acquisition

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Showing 5 of 6 publications

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