CONFERENCE PROCEEDINGS
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Johnson Chang-Cheng Hung
Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 17 December 2003 Paper
Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
Rick Lai, Luke Hsu, Chiun Hong Kung, Johnson Hung, Wei Huang, Chue-San Yoo, Yao-Tsu Huang, Vincent Hsu
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518016
KEYWORDS: Inspection, Calibration, Reticles, Photomasks, Defect detection, Image transmission, Manufacturing, SRAF, Lithography, Defect inspection
Proceedings Article | 28 August 2003 Paper
Mask cost and cycle time reduction
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504288
KEYWORDS: Photomasks, Optical proximity correction, Inspection, Semiconducting wafers, Defect inspection, Lithography, Critical dimension metrology, Mask making, Manufacturing, Vestigial sideband modulation
Proceedings Article | 28 August 2003 Paper
Inspection of aggressive OPC using aerial image-based mask inspection
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504058
KEYWORDS: Inspection, Optical proximity correction, Heads up displays, Lithium, Imaging systems, Airborne remote sensing
Proceedings Article | 27 December 2002 Paper
Aerial-image-based inspection of binary (OPC) and embedded-attenuated PSM
Felix Chang, Chang-Cheng Hung, John Lin, Anja Rosenbusch, Reuven Falah, Shirley Hemar
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467767
KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Binary data, Defect detection, Airborne remote sensing, Wafer-level optics
Proceedings Article | 1 August 2002 Paper
Progressive self-learning photomask defect classification
Eric Lynn, Shih-Ying Chen, Tyng-Hao Hsu, Chang-Cheng Hung, Chin-Hsiang Lin
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477012
KEYWORDS: Photomasks, Image processing, Library classification systems, Inspection, Detection and tracking algorithms, Image segmentation, Solids, Feature extraction, Optical proximity correction, Manufacturing
Conference Committee Involvement (4)
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
Photomask Technology
9 September 2003 | Monterey, California, United States
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