Optical design of an image magnifier based on a lens array is presented. The proposed image magnifier does not have a limit for object size due to off-axis aberration because the object is divided into segments and is kept apart from the nearest neighbor segment with the period of the lens array. Several images can be sequentially generated by magnifying sequentially specific objects among mosaic objects, which are composed of multi-images. The designed lens for the image magnifier corresponds to a lens array with an aperture of 2 mm and a magnification ratio of 3. Furthermore, an application for a display system of the designed image magnifier is also presented.
A refractive beam shaper is designed, which transforms a Gaussian beam profile into a diverging uniform line beam profile, exactly, an elongated super-Gaussian profile. The advantage of our optical system is that the area of uniform illumination can be changed by simply shifting the position of the observation plane without using an additional optical element. Whereas previous refractive beam shapers have been designed to have a specific intensity distribution at a certain position, our refractive beam shaper has been designed to generate a desired intensity and wavefront simultaneously, so that it gives a desired beam profile during propagation. The designed refractive beam shaper generates a uniform line beam with 4 mm beam width at half maximum intensity and a diverging angle of 13.3 deg. Furthermore, we have checked the utility and the stability of the output beam by calculating the changes in the size, the uniformity, and the efficiency of the line beam when it propagates a distance of 960 mm.
A prototype of large wide field telescope is a Cassegrain telescope which covers 2° field of view with two hyperbolic mirrors, a 0.5 m primary mirror and a 0.2 m secondary mirror with multiple correction lenses. To fulfill the optical and mechanical performance requirements in design and development phase extensive finite element analyses using NX NASTRAN and optical analyses with CODE V and PCFRINGE have been conducted for the structure of optical system. Analyses include static deformation (gravity and thermal), frequency, dynamic response analysis, and optical performance evaluations for minimum optical deformation. Image motion is also calculated based on line of sight sensitivity equations integrated in finite element models. A parametric process was performed for the design optimization to produce highest fundamental frequency for a given weight, as well as to deal with the normal concerns about global performance.
We explain a new lens mounting scheme using cascaded ring flexures for minimizing thermal stresses. Two
circular rings are concentric at the adhesive insertion hole and made monolithically on a lens cell. Six degree-of-freedom
motions can be accommodated by controlling dimensional parameters. Thermo-elastic deformations are
evaluated by interferometric measurements and are verified with finite element analyses. Athermal performances
from a simple elastomeric mount and a ring-flexured mount are also compared. This lens mounting scheme was
successfully applied to our space-borne optical system and will be a promising candidate for environmentally
challenged optical systems such as military applications.
The Korea Astronomy and Space Science Institute (KASI) are under development three 1.6m optical telescopes for the
Korea Micro-lensing Telescope Network (KMTNet) project. These will be installed at three southern observatories in
Chile, South Africa, and Australia by middle 2014 to monitor dense star fields like the Galactic bulge and Large
Magellanic Cloud. The primary scientific goal of the project is to discover numerous extra-solar planets using the
gravitational micro-lensing technique. We have completed the final design of the telescope. The most critical design
issue was wide-field optics. The project science requires the Delivered Image Quality (DIQ) of less than 1.0 arcsec
FWHM within 1.2 degree radius FOV, under atmospheric seeing of 0.75 arcsec. We chose the prime-focus configuration
and realized the DIQ requirement by using a purely parabolic primary mirror and four corrector lenses with all spherical
surfaces. We present design results of the wide-field optics, the primary mirror coating and support, and the focus system
with three linear actuators on the head ring.
We propose a microscopic system which could be applied to three-dimensional surface profile measurement. In the
system, a two-dimensional pinhole array is imaged onto the surface under measurement by an objective lens. These spots
act as discrete object points which are then imaged to the CCD chip by the microscope which contains two orthogonal
cylindrical lenses. Due to the astigmatism of the two cylindrical lenses, the shape of the image of object points on the
CCD camera becomes oval unless the object point is located at a position which satisfies the best imaging condition. By
calculating the focus error signal using the intensities measured at a group of CCD cells, the information on the distance
of the corresponding object point could be found out.
The basic concept of the system was checked by computer simulation on the point spread function of various object
points. A preliminary measurement system which consists of the same optical components used in the computer
simulation has been set up for verification of the idea. Since this system requires only one image to analyze the surface
profile, it is a one-shot measurement system, and is insensitive to environmental noises such as mechanical vibration.
In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the
illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary
to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape
defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics
of the mask pattern and its performance was evaluated with the simulated Bossung curves.
We present a polarization analysis system to measure the birefringence of scanning lens. This technique is based on
rotating-analyzer ellipsometer. The liquid immersion method is applied to measure the birefringence distribution
regardless of the shape of the test lens. In this report, the principle of the two dimensional measurement system and the
result of 2-D birefringence distribution in scanning lens are presented.
Collimator is essential to evaluate and assemble the other telescopes. Its diameter should be larger than that of the target telescope for the correct use. We are currently developing the Cassegrain type collimator of which diameter is 0.9 m. The primary mirror is light-weighted so that its weight is only 70 kg. Due to its structure, the primary mirror can be supported only at the backside of the mirror. This mirror is tested with the combination of null Hartmann test and interferometer. The secondary mirror is tested with a Hindle method. This method requires 600 mm high quality spherical mirror. The distance between the primary and secondary mirror is maintained by the Carbon composite material. The assembly of two mirrors is carried out by the computer aided alignment method. The whole structure is designed to maintain the performance of the collimator under +/-5 degrees of temperature variation.
In the optical testing of aspheric lenses, the phase shifting lateral shearing interferometer has attracted considerable attention because of its advantage in alignment work. And many phase shifting lateral shearing interferometers were developed. But all of them are time delayed methods which have the time lag between the measurements. When air turbulence and vibration is present, this time lag can be onerous error sources. If we measure all the required interferograms for the phase shifting method at the same time, there should be no time leg. We present a simple instantaneous phase shifting lateral shearing interferometer using a wedge plate and two identical transmission gratings and reconstruct the wavefront error of measured instantaneous phase shifting lateral shearing interferograms.
In this paper, the boundary element method (BEM) is newly applied to the numerical simulation of an optical lithography, and also is combined with the wavelet matrix transform approach in order to resolve the disadvantage of BEM. Though the impedance matrix derived from the boundary element formulation is usually unsymmetric and fully populated with non-zero elements, the combination of two methods transforms it into the highly sparse matrix, which can be solved efficiently by a sparse solver. The prosed method is implemented for analyzing the topological effect of 2D phase-shifting masks, and their result are compared with those of the waveguide method. From the comparison, it is confirmed that the proposed method would be more efficient than the methods based on either BEM itself or the waveguide method in views of the convergence, the accuracy, the calculation time and the usage of computer memory.
The three-dimensional optical lithography simulator on the basis of finite element method is newly introduced. Contrary to the conventional direct finite element method, the problem of huge memory requirement can be resolved by applying the substructuring method to finite element method. In our scheme, the global domain, which consists of photoresist, interlayers, and the substrate, is divided into several subdomains. After each subdomain is treated locally, the calculation results are integrated altogether. Since the consuming memory is tremendously reduced by the substructuring method, the three- dimensional case can be successfully simulated at the engineering workstation. We have compared our scheme with the conventional direct finite element, and investigated the reduction of computational memory by the substructuring method.
We have developed our own three-dimensional optical lithography simulator, LG-OLiS (LG-Optical Lithography Simulator), which can be applied to both the 2-D and the 3-D non-planar cases. It includes with all processes of optical lithography such as the formation of an aerial image, the exposure, the post-exposure bake (PEB), and the development processes. Several kinds of numerical methods are adopted for numerical implementation and the simulation of an aerial image and the exposure process are based on both the approximate theory and the rigorous theory. Therefore, our LG-OLiS can simulate the topological case efficiently nd exactly.
A new methodology using the admittance diagram is proposed for optimization of an antireflective layer (ARL) and the simple ARL optimizer with its own 2D and 3D dynamic graphic tools is developed. Under the methodology, the overall dependency of the reflectivity on optical properties of ARLs can be viewed from a single 2D graph, and the tolerance of process step for the optimally designed ARL can be evaluated geometrically. And also, the optimal condition of an ARL for DUV lithography process is determined by our optimizer and its performance is simulated from our own lithography simulator based on rigorous vector theory. Finally, the effect of ARLs are investigated experimentally, and their results are compared with simulation results.
This paper discusses a more stable algorithm of rigorous coupled wave analysis applicable to 2-D exposure simulation in an optical lithography. This algorithm can resolve a divergence problem inherently and can easily be implemented as a full vector model. 2-D exposure simulator based on this algorithm is developed and applied successfully to a very thick photoresist system. Intensity distributions inside the photoresist are simulated and compared with those of other vector models. The adaptive layering technique is introduced to the simulation of bleaching process in order to reduce the computation time. It is found that the technique can greatly reduce memeory size and computation time with reasonable accuracy.
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