Dr. Jörg Zimmermann
Principal at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

Proceedings Article | 21 November 2023 Paper
Proceedings Volume 12750, 127500O (2023) https://doi.org/10.1117/12.2687658
KEYWORDS: Optics manufacturing, EUV optics, Scanners, Optical resolution, Imaging systems, High volume manufacturing, Projection systems, Mirrors, Metrology, Manufacturing

Proceedings Article | 28 April 2023 Paper
Rongkuo Zhao, Fan Zhou, Jialei Tang, Jeff Lu, Yunbo Liu, Dezheng Sun, Ming-Chun Tien, Stephen Hsu, Rachit Gupta, Youping Zhang, Joerg Zimmermann
Proceedings Volume 12495, 124950R (2023) https://doi.org/10.1117/12.2660858
KEYWORDS: Source mask optimization, SRAF, Light sources and illumination, Extreme ultraviolet, 3D mask effects, Image quality, Computational lithography

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 1249509 (2023) https://doi.org/10.1117/12.2658871
KEYWORDS: Metals, Extreme ultraviolet, Source mask optimization, Nanoimprint lithography, Personal protective equipment, Critical dimension metrology, Logic, Optical lithography, Surface plasmons, Lithography

Proceedings Article | 28 April 2023 Presentation + Paper
Austin Peng, Christopher Kaplan, Jeff Lu, Michael Crouse, Zuanyi Li, Xiaobo Xie, David Rio, Achim Woessner, Alexander Tan, Cuiping Zhang, Xiaoyang Li, Dezheng Sun, Stephen Hsu, Rafael Howell, Joerg Zimmermann
Proceedings Volume 12494, 124940C (2023) https://doi.org/10.1117/12.2657454
KEYWORDS: Source mask optimization, Computational lithography, Nanoimprint lithography, Extreme ultraviolet, Semiconducting wafers, Scanners, Modeling, Reticles, Artificial intelligence, Light sources and illumination

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940M (2023) https://doi.org/10.1117/12.2657983
KEYWORDS: Source mask optimization, Metals, Extreme ultraviolet lithography, SRAF, Logic, Photomasks, Printing, Extreme ultraviolet

Showing 5 of 29 publications
Conference Committee Involvement (4)
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2021
27 September 2021 | Online Only, United States
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