Mr. Kunal N. Taravade Profile

Kunal N. Taravade

Director of Product Engineer at Synopsys Inc

SPIE Involvement:

Author

Proceedings Article | 24 February 2021 Presentation

New scaling enablers in computational lithography

Kunal Taravade

Proceedings Volume 11613, 1161303 (2021) https://doi.org/10.1117/12.2589319

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Proceedings Article | 14 October 2011 Paper

Integrated advanced hotspot analysis techniques in the post-OPC verification flow

Makoto Miyagi, Peter Brooker, Chander Sawh, Travis Brist, Kunal Taravade

Proceedings Volume 8166, 81663P (2011) https://doi.org/10.1117/12.900609

KEYWORDS: Lithography, 3D modeling, Optical proximity correction, Photomasks, Computer simulations, Semiconducting wafers, Wafer-level optics, Source mask optimization, Tolerancing, Data modeling

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Proceedings Article | 25 September 2010 Paper

Simultaneous source-mask optimization: a numerical combining method

Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Thomas Klimpel, Hans-Jürgen Stock, Amyn Poonawala, Kunal Taravade, William Stanton

Proceedings Volume 7823, 78233X (2010) https://doi.org/10.1117/12.865965

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Electroluminescence, Image processing, Lithography, Semiconducting wafers, Cadmium sulfide, Optimization (mathematics), Manufacturing

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Proceedings Article | 29 May 2007 Paper

Stray-light implementation in optical proximity correction (OPC)

Young-Chang Kim, Donghyun Kim, Insung Kim, Sangwook Kim, Sungsoo Suh, Yong-Jin Chun, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Kunal Taravade, Sooryong Lee

Proceedings Volume 6607, 66071M (2007) https://doi.org/10.1117/12.728969

KEYWORDS: Optical proximity correction, Stereolithography, Stray light, Convolution, Photomasks, Modulation transfer functions, Spatial light modulators, Semiconducting wafers, Image quality, Critical dimension metrology

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Proceedings Article | 15 May 2007 Paper

Functionality and performance improvements with field-based OPC

Ben Painter, Kunal Taravade, Levi Barnes, Robert Lugg, Jeff Mayhew, Glenn Newell, Kevin Lucas

Proceedings Volume 6607, 66072T (2007) https://doi.org/10.1117/12.729012

KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Atrial fibrillation, Image segmentation, Semiconducting wafers, Lithography, Tolerancing, Performance modeling, Computer simulations

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Proceedings Article | 28 May 2004 Paper

Analysis of off-axis illumination-based phase-edge/chromeless mask technologies

Ebo Croffie, Kunal Taravade, Neal Callan, Keuntaek Park, Gregory Hughes

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536172

KEYWORDS: Photomasks, Reticles, Data conversion, Semiconducting wafers, Manufacturing, Lithography, Printing, Scanning electron microscopy, Phase shifts, Lithographic illumination

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Proceedings Article | 28 May 2004 Paper

Two-dimensional-image-based model calibration for OPC applications

Kunal Taravade, Ebo Croffie, Andrew Jost

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.538244

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Calibration, Process modeling, Lithography, Critical dimension metrology, Image processing, Data modeling, Reticles, Semiconducting wafers

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Proceedings Article | 17 December 2003 Paper

Manufacturing of ArF chromeless hard shifter for 65-nm technology

Keun-Taek Park, Laurent Dieu, Greg Hughes, Kent Green, Ebo Croffie, Kunal Taravade

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518252

KEYWORDS: Optical design, Photomasks, Quartz, Etching, Semiconducting wafers, Printing, Critical dimension metrology, Manufacturing, Line edge roughness, Tolerancing

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Proceedings Article | 17 December 2003 Paper

Multichip reticle approach for OPC model verification

Kunal Taravade, Nadya Belova, Andrew Jost, Neal Callan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518217

KEYWORDS: Optical proximity correction, Reticles, Semiconducting wafers, Logic, Metals, Inspection, Performance modeling, Photomasks, Manufacturing, Lithography

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Proceedings Article | 2 July 2003 Paper

Electrical validation of resolution enhancement techniques

Kunal Taravade, Neal Callan, Ebo Croffie, Aftab Ahmad

Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485275

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Semiconducting wafers, Reticles, Transistors, Scanning electron microscopy, Manufacturing, Performance modeling, Tolerancing, Instrument modeling

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Proceedings Article | 26 June 2003 Paper

Dark-field high-transmission chromeless lithography

George Bailey, Neal Callan, Kunal Taravade, John Jensen, Benjamin Eynon, Patrick Martin, Henry Kamberian, Darren Taylor, Rick Farnbach

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485518

KEYWORDS: Photomasks, Opacity, Scattering, Lithography, Diffraction gratings, Scanning electron microscopy, Manufacturing, Attenuators, Finite element methods, Optical design

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