Dr. Kyle Braam Profile

Dr. Kyle Braam

Engineer & Design at Synopsys Inc

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Author

Publications (9)

Proceedings Article | 12 November 2024 Presentation + Paper

Assessing need and methodology for mask constraints in ILT applications

Mohamed Ramadan, Chris Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, Alex Zepka, Yu-Po Tang, Szu Ping Chen, Eric Huang, Gloria Yeh, Nicole Wu, Chun-Cheng Liao

Proceedings Volume 13216, 132161Q (2024) https://doi.org/10.1117/12.3042434

KEYWORDS: Semiconducting wafers, Printing, Vestigial sideband modulation, Photoresist processing, Simulations, Design rules, Chip manufacturing, SRAF, Optical proximity correction, Lithography

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Proceedings Article | 30 April 2023 Presentation

Machine learning based inverse lithography technology for an advanced DRAM contact layer

Moongyu Jeong, Hyunchul Kim, Kyle Braam, Munhoe Do, Kangjin Kim, Jongcheon Park, Chunsoo Kang, Chanha Park, Thomas Cecil

Proceedings Volume 12495, 124951E (2023) https://doi.org/10.1117/12.2657808

KEYWORDS: Machine learning, Lithography, Photomasks, Source mask optimization, Numerical analysis, Convolutional neural networks, Computational lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Automatic generation of representative and diversified pattern samples from a full chip layout

Jun Zhu, Brad Falch, Kyle Braam, Petrisor Panaite, Ming Su, C. Jay Lee

Proceedings Volume 12495, 124951B (2023) https://doi.org/10.1117/12.2662024

KEYWORDS: Education and training, Design and modelling, Statistical modeling, Machine learning, Reflection, Principal component analysis, Feature extraction, Transform theory, Statistical analysis, Data modeling

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Proceedings Article | 28 April 2023 Presentation + Paper

Full chip inverse lithography technology mask synthesis for advanced memory manufacturing

Jennefir Digaum, Gary Chiang, Lin Wang, Kyle Braam, Dave Gerold, Yongdong Wang, Thuc Dam

Proceedings Volume 12495, 1249503 (2023) https://doi.org/10.1117/12.2657538

KEYWORDS: Design and modelling, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Visualization, Reticles, Printing, 193nm lithography, Source mask optimization

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Proceedings Article | 22 March 2021 Presentation + Paper

Machine learning ILT for memory customers

Thomas Cecil, Kyle Braam, Ahmed Omran, Amyn Poonawala, Jason Shu, Clark Vandam

Proceedings Volume 11613, 116130P (2021) https://doi.org/10.1117/12.2587107

KEYWORDS: Machine learning, Visualization, Optical proximity correction, Neural networks

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Proceedings Article | 23 March 2020 Presentation + Paper

Advanced memory cell design optimization with inverse lithography technology

Jiro Higuchi, Weiting Wang, Takamasa Takaki, Hiromitsu Mashita, Shigeki Nojima, Ahmed Omran, Ken Hanafusa, Seunghee Baek, Ryan Chen, Yukio Asaka, Kyle Braam, Hironobu Taoka, Guangming Xiao

Proceedings Volume 11328, 1132806 (2020) https://doi.org/10.1117/12.2557847

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Bridges, Data analysis, Semiconducting wafers, Resolution enhancement technologies, SRAF

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Proceedings Article | 23 March 2020 Presentation + Paper

Establishing fast, practical, full-chip ILT flows using machine learning

Thomas Cecil, Kyle Braam, Ahmed Omran, Amyn Poonawala, Jason Shu, Clark Vandam

Proceedings Volume 11327, 1132706 (2020) https://doi.org/10.1117/12.2551425

KEYWORDS: Data modeling, Photomasks, Lithography, Machine learning, Optical proximity correction, Convolution, Network architectures, Inverse problems, Calibration

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Proceedings Article | 5 April 2019 Presentation + Paper

EUV mask synthesis with rigorous ILT for process window improvement

Kyle Braam, Kosta Selinidis, Wolfgang Hoppe, Hongyuan Cai, Guangming Xiao

Proceedings Volume 10962, 109620P (2019) https://doi.org/10.1117/12.2515156

KEYWORDS: Extreme ultraviolet, Photomasks, Stochastic processes, Lithography, Extreme ultraviolet lithography, 3D modeling, Optical lithography, Manufacturing, EUV optics, Electromagnetism

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Proceedings Article | 20 March 2018 Paper

Rigorous ILT optimization for advanced patterning and design-process co-optimization

Kosta Selinidis, Bernd Kuechler, Howard Cai, Kyle Braam, Wolfgang Hoppe, Vitaly Domnenko, Amyn Poonawala, Guangming Xiao

Proceedings Volume 10587, 105870M (2018) https://doi.org/10.1117/12.2299375

KEYWORDS: Photomasks, Lithography, Optical lithography, 3D modeling, Optical proximity correction, Calibration, Photoresist processing, Manufacturing, Computer simulations, Source mask optimization

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Showing 5 of 9 publications

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