Dr. Lauren McQuade
at Inpria Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 10 April 2024 Presentation + Paper
Craig Needham, Ulrich Welling, Amrit Narasimhan, Peter De Schepper, Lauren McQuade, Michael Kocsis, Lawrence Melvin, Jason Stowers, Stephen Meyers
Proceedings Volume 12957, 129571B (2024) https://doi.org/10.1117/12.3010941
KEYWORDS: Data modeling, Calibration, Thermal modeling, Performance modeling, Simulations, Photoresist materials, Metal oxides, Line width roughness, Mathematical modeling, Lithography

Proceedings Article | 10 April 2024 Presentation + Paper
Sonia Castellanos, Peter De Schepper, Maireyee Bhattacharya, Jan Doise, Joren Wouters, Amrit Narasimhan, Brian Cardineau, Lauren McQuade, Craig Needham, Michael Kocsis, Kazuki Kasahara, Stephen Meyers
Proceedings Volume 12957, 1295707 (2024) https://doi.org/10.1117/12.3010921
KEYWORDS: Humidity, Extreme ultraviolet lithography, Critical dimension metrology, Printing, Contamination, Semiconducting wafers, Metal oxides, Image processing, Environmental sensing, Chemical analysis

Proceedings Article | 9 April 2024 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka, Soichiro Okada, Shinichiro Kawakami, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu, Reiko Tsuzuki, Xiang Liu, Arame Thiam, Yannick Feurprier, Kathleen Nafus, Michael Carcasi, Lior Huli, Kanzo Kato, Alexandra Krawicz, Michael Kocsis, Peter De Schepper, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Bruno La Fontaine, Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 12957, 1295705 (2024) https://doi.org/10.1117/12.3010207
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Tin, Lithography, Etching

Proceedings Article | 1 May 2023 Paper
Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael Carcasi, Ankur Agarwal, Mark Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
Proceedings Volume 12498, 1249806 (2023) https://doi.org/10.1117/12.2655928
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Line edge roughness, Lithography, Etching

Proceedings Article | 30 April 2023 Presentation
Peter De Schepper, Brian Cardineau, Amrit Narasimhan, Lauren McQuade, Jan Doise, Michael Kocsis, Kazuki Kasahara, Stephen Meyers
Proceedings Volume 12498, 1249804 (2023) https://doi.org/10.1117/12.2658499
KEYWORDS: Photoresist processing, Extreme ultraviolet lithography, Scanners, Etching, Photoresist materials, Oxides, Metals, Image resolution, High volume manufacturing, Chemistry

Proceedings Article | 23 March 2020 Presentation + Paper
Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 11323, 113230B (2020) https://doi.org/10.1117/12.2552125
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Showing 5 of 6 publications
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