CONFERENCE PROCEEDINGS
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Lucien Bouchard
Vice President at Photronics Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 20 October 2020 Presentation + Paper
Patterning solutions for NTD contact hole levels in advanced DRAM nodes
Michael Green, Tsu-Wen Huang, Mohamed Ramadan, Hung-Chang Szu, Yeu Dong Gau, Chih-Ying Tsai, Young Ham, Chun-Cheng Liao, Lucien Bouchard, Eric Huang, Wei-Cheng Shiu, Chris Progler
Proceedings Volume 11518, 115180N (2020) https://doi.org/10.1117/12.2574713
KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Lithography, Optical proximity correction, Immersion lithography, 193nm lithography, Critical dimension metrology
Proceedings Article | 21 July 2000 Paper
Overview and status of the Next Generation Lithography Mask Center of Competency
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390052
KEYWORDS: Photomasks, X-rays, Charged-particle lithography, Image processing, X-ray technology, Etching, Diamond, Semiconducting wafers, X-ray imaging, Silicon
Proceedings Article | 19 July 2000 Paper
Next-generation lithography mask development at the NGL-MCOC
Michael Lercel, Kenneth Racette, Christopher Magg, Mark Lawliss, Kevin Collins, Monica Barrett, Michael Trybendis, Lucien Bouchard
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392049
KEYWORDS: Photomasks, Etching, X-rays, Image processing, Silicon, Scattering, Photoresist processing, Lithography, Diamond, Extreme ultraviolet lithography
Proceedings Article | 30 December 1999 Paper
Next-generation lithography mask development at the NGL Mask Center of Competency
Michael Lercel, Cameron Brooks, Kenneth Racette, Christopher Magg, Mark Lawliss, Neal Caldwell, Raymond Jeffer, Kevin Collins, Monica Barrett, Steven Nash, Michael Trybendis, Lucien Bouchard
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373374
KEYWORDS: Photomasks, X-rays, Critical dimension metrology, Etching, Semiconducting wafers, Electron beam lithography, Silicon, Lithography, X-ray lithography, Extreme ultraviolet
Conference Committee Involvement (8)
Photomask Technology
21 September 2020 | Online Only, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
Showing 5 of 8 Conference Committees
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