Mr. Manoj M. Chacko Profile

Manoj M. Chacko

Director/Product Management at Cadence Design Systems Inc

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Author

Publications (7)

Proceedings Article | 1 November 2007 Paper

Integration of OPC and mask data preparation for reduced data I/O and reduced cycle time

Ray Morgan, Manoj Chacko, Dan Hung, Johnny Yeap, Mathias Boman

Proceedings Volume 6730, 67304E (2007) https://doi.org/10.1117/12.747300

KEYWORDS: Optical proximity correction, Photomasks, Computed tomography, Resolution enhancement technologies, Data processing, Design for manufacturing, Explosives, Parallel computing, Semiconductors, Electronic design automation

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Proceedings Article | 9 November 2005 Paper

FPGA chip performance improvement with gate shrink through alternating PSM 90nm process

Chun-Chi Yu, Ming-Feng Shieh, Erick Liu, Benjamin Lin, Jonathan Ho, Xin Wu, Petrisor Panaite, Manoj Chacko, Yunqiang Zhang, Wen-Kang Lei

Proceedings Volume 5992, 59925A (2005) https://doi.org/10.1117/12.637426

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Critical dimension metrology, Design for manufacturing, Halftones, Manufacturing, Semiconducting wafers, Image processing, Field programmable gate arrays

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Proceedings Article | 9 November 2005 Paper

Optimal distributed computing resources for mask synthesis and tape-out in production environment: an economic analysis

Chris Cork, Manoj Chacko, Shimon Levi

Proceedings Volume 5992, 59924C (2005) https://doi.org/10.1117/12.637424

KEYWORDS: Photomasks, Optical proximity correction, Silicon, Prototyping, Resolution enhancement technologies, Manufacturing, Metals, Distributed computing, Semiconductors, Data processing

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Proceedings Article | 28 June 2005 Paper

An efficient resolution enhancement technique flow for 65nm logic poly layer

Paul van Adrichem, Manoj Chacko, Bryan Kasprowicz

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617363

KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Manufacturing, Logic, Semiconducting wafers, Phase shifts, Critical dimension metrology, Cadmium, Phase shifting

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Proceedings Article | 28 June 2005 Paper

An economic analysis for optimal distributed computing resources for mask synthesis and tape-out in production environment

Chris Cork, Robert Lugg, Manoj Chacko, Shimon Levi

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617132

KEYWORDS: Photomasks, Optical proximity correction, Silicon, Prototyping, Resolution enhancement technologies, Metals, Distributed computing, Semiconductors, Databases

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Proceedings Article | 28 June 2005 Paper

Reducing alternating phase shift mask (Alt-PSM) write-time through mask data optimization

Bryan Kasprowicz, Paul van Adrichem, Manoj Chacko

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617136

KEYWORDS: Photomasks, Reticles, Quartz, Etching, Optical proximity correction, Phase shifts, Resolution enhancement technologies, Manufacturing, SRAF, Binary data

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Proceedings Article | 5 May 2005 Paper

DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask (Alt-PSM) on a 90-nm FPGA chip

Chun-Chi Yu, Ming-Feng Shieh, Erick Liu, Benjamin Lin, Henry Lin, Manoj Chacko, Xiaoyang Li, Wen-Kang Lei, Jonathan Ho, Xin Wu

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.598838

KEYWORDS: Photomasks, Design for manufacturing, Optical proximity correction, Critical dimension metrology, Image processing, Manufacturing, Electronic design automation, Etching, Halftones, Lithography

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Showing 5 of 7 publications

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