Manuela S. Gutsch
at Qoniac GmbH
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 10 April 2024 Poster + Paper
Alberto Lopez-Gomez, Stefan Buhl, Eric Jehnes, Patrick Lomtscher, Manuela Gutsch, Xaver Thrun, Clemens Utzny, Philip Groeger, Johannes Kowalewski
Proceedings Volume 12955, 129553T (2024) https://doi.org/10.1117/12.3022117
KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Modeling, Interpolation, High volume manufacturing, Data modeling, Performance modeling, Mixtures

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 1132507 (2020) https://doi.org/10.1117/12.2551082
KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Metals, Metrology, Critical dimension metrology, Databases, Inspection, Computer simulations, Scanners

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105851H (2018) https://doi.org/10.1117/12.2299299
KEYWORDS: Overlay metrology, Etching, Lithography, Semiconducting wafers, Metrology, Critical dimension metrology, Molybdenum, Information operations, Optical lithography, Double patterning technology

Proceedings Article | 13 March 2018 Paper
Gerd Krause, Detlef Hofmann, Boris Habets, Stefan Buhl, Manuela Gutsch, Alberto Lopez-Gomez, Xaver Thrun
Proceedings Volume 10585, 105852C (2018) https://doi.org/10.1117/12.2302972
KEYWORDS: Resistance, Etching, Semiconducting wafers, Copper, Chemical mechanical planarization, Oxides, Critical dimension metrology, Metals, Scatter measurement, Scatterometry

Proceedings Article | 13 March 2018 Paper
Gerd Krause, Detlef Hofmann, Boris Habets, Stefan Buhl, Manuela Gutsch, Alberto Lopez-Gomez, Wan-Soo Kim, Xaver Thrun
Proceedings Volume 10585, 105852T (2018) https://doi.org/10.1117/12.2302971
KEYWORDS: Critical dimension metrology, Oxides, Capacitance, Semiconducting wafers, Etching, Metals, Resistance, Copper, Photomasks, Chemical mechanical planarization

Showing 5 of 23 publications
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