Dr. Markus R. Weiss
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 9 November 2015 Paper
Proceedings Volume 9635, 96351D (2015) https://doi.org/10.1117/12.2205054
KEYWORDS: Extreme ultraviolet, Photomasks, Prototyping, Extreme ultraviolet lithography, Electromagnetic coupling, Metrology, Calibration, Scanners, Image acquisition, Image processing

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 942219 (2015) https://doi.org/10.1117/12.2086265
KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Imaging systems, Line width roughness, Scanners, Prototyping, EUV optics, Metrology, Reflectivity

Proceedings Article | 29 October 2014 Paper
Proceedings Volume 9235, 92350N (2014) https://doi.org/10.1117/12.2068308
KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Inspection, Electromagnetic coupling, Scanning electron microscopy, Prototyping, Manufacturing, Logic

Proceedings Article | 24 April 2014 Paper
Proceedings Volume 9048, 90480X (2014) https://doi.org/10.1117/12.2046302
KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Reticles, Scanners, System integration, Metrology, Prototyping, Manufacturing

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8886, 88860I (2013) https://doi.org/10.1117/12.2031611
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Photomasks, Electromagnetic coupling, Metrology, Prototyping, Inspection, Manufacturing, Reticles

Showing 5 of 14 publications
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