Dr. Matthias Cumme Profile

Dr. Matthias Cumme

at Carl Zeiss Jena GmbH

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 27 August 2015 Paper

Fabrication and qualification of roughness reference samples for industrial testing of surface roughness levels below 0.5 nm Sq

O. Faehnle, E. Langenbach, F. Zygalsky, F. Frost, R. Fechner, A. Schindler, M. Cumme, H. Biskup, C. Wünsche, R. Rascher

Proceedings Volume 9575, 957512 (2015) https://doi.org/10.1117/12.2189790

KEYWORDS: Surface roughness, Calibration, Silicon, Etching, Atomic force microscopy, Silica, Ion beams, Reactive ion etching, Measurement devices, Polishing

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Proceedings Article | 6 February 2008 Paper

Grayscale homogenizers in calcium fluoride

Jeffrey Lawrence, Lamarr Simmons, Andrew Stockham, John Smith, Gregg Borek, Matthias Cumme, Roman Kleindienst, Peter Weissbrodt

Proceedings Volume 6883, 68830O (2008) https://doi.org/10.1117/12.767531

KEYWORDS: Etching, Diffusers, Binary data, Microlens array, Semiconducting wafers, Calcium, Photoresist materials, Ions, Photomasks, Optics manufacturing

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Proceedings Article | 15 October 2005 Paper

Combined elements for beam shaping and polarization management

Matthias Cumme, Peter Triebel, Dirk Mademann, Manfred Schrenk, Peter Weissbrodt

Proceedings Volume 5962, 59621B (2005) https://doi.org/10.1117/12.625206

KEYWORDS: Beam shaping, Polarization, Optical components, Near field optics, Polarizers, Optical testing, Near field, Lithographic illumination, Silica, Binary data

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Proceedings Article | 12 May 2005 Paper

Hot spot free diffractive DUV-homogenizer for high NA-illumination

Matthias Cumme, Mirko Riethmuller, Dirk Mademann, Manfred Schrenk, Peter Weissbrodt

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598731

KEYWORDS: Diffractive optical elements, Beam shaping, Near field, Lithographic illumination, Silica, Optical alignment, Diffraction, Inspection, Lithography, Control systems

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Proceedings Article | 3 November 2003 Paper

Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements

Tobias Erdmann, Matthias Cumme, Lars-Christian Wittig, Ernst-Bernhard Kley, Frank Wyrowski, Andreas Tuennermann

Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.505751

KEYWORDS: Photomasks, Manufacturing, Lithography, Beam shaping, Analog electronics, Optical components, Photoresist processing, Optical lithography, Optics manufacturing, Glasses

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Proceedings Article | 3 November 2003 Paper

Resist hardening without surface deviation

Holger Hartung, Matthias Cumme, Mike Thieme, Ernst-Bernhard Kley, Andreas Tuennermann

Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.505797

KEYWORDS: Etching, Lithography, Silica, Chemical elements, Photomasks, Semiconductor lasers, Fabrication, Calibration, Beam shaping, Photoresist processing

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Proceedings Article | 9 November 2001 Paper

Thick refractive beam shaping elements applied to laser diodes

Matthias Cumme, Holger Hartung, Lars-Christian Wittig, Ernst-Bernhard Kley

Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448044

KEYWORDS: Beam shaping, Semiconductor lasers, Optical components, Lithography, Photomasks, Fabrication, Wave propagation, Surface roughness, Electron beams, Heat treatments

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Proceedings Article | 9 November 2001 Paper

Beam shaping for multimode beams

Lars-Christian Wittig, Matthias Cumme, Stefan Nolte, Ernst-Bernhard Kley, Andreas Tuennermann

Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448054

KEYWORDS: Beam shaping, Optical components, Multimode fibers, Wave propagation, Spherical lenses, Lithography, Beam propagation method, High power lasers, Micro optics, Materials processing

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Proceedings Article | 6 October 2000 Paper

Fabrication and properties of refractive micro-optical profiles for lenses, lens arrays, and beam-shaping elements

Ernst-Bernhard Kley, Matthias Cumme, Lars-Christian Wittig, Andreas Tuennermann

Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402780

KEYWORDS: Optical components, Lithography, Chemical elements, Beam shaping, Lenses, Micro optics, Spherical lenses, Wave propagation, Semiconductor lasers, Photomasks

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Proceedings Article | 6 October 2000 Paper

Large-area gratings fabricated by ultrafast e-beam writing

Ernst-Bernhard Kley, T. Clausnitzer, Matthias Cumme, Karsten Zoellner, Bernd Schnabel, A. Stich

Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402775

KEYWORDS: Binary data, Diffraction gratings, Wavefronts, Error analysis, Chromium, Photoresist processing, Etching, Electron beam lithography, Beam shaping, Diffraction

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Proceedings Article | 18 August 2000 Paper

Beam-shaping elements for holographic applications

Ernst-Bernhard Kley, Matthias Cumme, Lars-Christian Wittig, Mike Thieme, Werner Gabler

Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395687

KEYWORDS: Beam shaping, Holography, Gaussian beams, Wavefronts, Optical components, Spherical lenses, Holograms, Holography applications, Superposition, Optical design

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Proceedings Article | 24 March 2000 Paper

Active and passive components of 3D integrated optics

Christoph Waechter, Th. Bauer, Matthias Cumme, Peter Dannberg, Wilhelm Elflein, Thomas Henning, Ulrich Streppel, Wolfgang Karthe

Proceedings Volume 3936, (2000) https://doi.org/10.1117/12.379943

KEYWORDS: Waveguides, Directional couplers, Polymers, Integrated optics, Switching, Polymer multimode waveguides, Wave propagation, Tolerancing, Refractive index, Signal attenuation

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Proceedings Article | 31 August 1999 Paper

Fabrication and properties of refractive micro-optical beam-shaping elements

Ernst-Bernhard Kley, Lars-Christian Wittig, Matthias Cumme, Uwe Zeitner, Peter Dannberg

Proceedings Volume 3879, (1999) https://doi.org/10.1117/12.360513

KEYWORDS: Beam shaping, Chemical elements, Lithography, Optical components, Glasses, Fabrication, Electron beam lithography, Photomasks, Polymers, Micro optics

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Proceedings Article | 1 June 1999 Paper

Adapting existing e-beam writers to write HEBS-glass gray-scale masks

Ernst-Bernhard Kley, Matthias Cumme, Lars-Christian Wittig, Chuck Wu

Proceedings Volume 3633, (1999) https://doi.org/10.1117/12.349333

KEYWORDS: Beam shaping, Photomasks, Thermal effects, Glasses, Gaussian beams, Silver, Electron beams, Lithography, Calibration, Ions

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Showing 5 of 14 publications

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