Dr. Michael J. Bohan Profile

Dr. Michael J. Bohan

Sr. Optics Design Engineer at Applied Materials Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 16 June 2005 Paper

ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam

Paul Allen, Mike Bohan, Eric Christenson, H. Dai, M. Duane, H. Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637280

KEYWORDS: Semiconducting wafers, Photomasks, Metals, Reticles, Deep ultraviolet, Optical proximity correction, Manufacturing, Electron beam lithography, Lithography, Control systems

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Proceedings Article | 6 December 2004 Paper

Next-generation DUV ALTA mask patterning capabilities

Paul Allen, Michael Bohan, Eric Christenson, H. Christopher Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White, Michael Ungureit, Alan Wickstrom, Robert Kiefer, Curt Jackson

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570291

KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Reticles, Lithography, Vestigial sideband modulation, Signal detection, Artificial intelligence, Servomechanisms, Mirrors

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Proceedings Article | 11 March 2002 Paper

Implementation and characterization of a DUV raster-scanned mask pattern generation system

Michael Bohan, Henry Chris Hamaker, Warren Montgomery

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458301

KEYWORDS: Deep ultraviolet, Reticles, Printing, Germanium, Critical dimension metrology, Crystals, Composites, Photomasks, Bragg cells, Laser crystals

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Proceedings Article | 17 May 1994 Paper

Techniques for improving overlay on multilayer phase-shift masks

Henry Chris Hamaker, Michael Bohan, Peter Buck, Claudia Geller, Takashi Makiyama, Francis Mathew, William Neeland

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175411

KEYWORDS: Optical alignment, Overlay metrology, Printing, Photomasks, Metrology, CCD cameras, Cameras, Etching, Error analysis, Tolerancing

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Proceedings Article | 1 June 1990 Paper

Alignment performance of a 0.6-NA 364-nm laser direct writer

Michael Bohan

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20215

KEYWORDS: Optical alignment, Semiconducting wafers, Beam splitters, Overlay metrology, Calibration, Wafer-level optics, Reticles, Mirrors, Optical lithography, Diffusers

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