Mr. Michael R. Dickinson Profile

Michael R. Dickinson

Engineering Technical Supervisor at Lawrence Berkeley National Lab

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Publications (6)

Proceedings Article | 23 March 2020 Presentation + Paper

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu

Proceedings Volume 11323, 113230B (2020) https://doi.org/10.1117/12.2552125

KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

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Proceedings Article | 26 March 2019 Presentation + Paper

Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

Christopher Anderson, Arnaud Allezy, Weilun Chao, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Stephen Meyers, Ryan Miyakawa, Patrick Naulleau, Senajith Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu

Proceedings Volume 10957, 1095708 (2019) https://doi.org/10.1117/12.2516339

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

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Proceedings Article | 26 March 2019 Paper

Achieving diffraction-limited performance on the Berkeley MET5

Ryan Miyakawa, Chris Anderson, Wenhua Zhu, Geoff Gaines, Jeff Gamsby, Carl Cork, Gideon Jones, Michael Dickenson, Seno Rekawa, Weilun Chao, Sharon Oh, Patrick Naulleau

Proceedings Volume 10957, 109571X (2019) https://doi.org/10.1117/12.2516384

KEYWORDS: Wavefronts, Diffraction gratings, Interferometry, Shearing interferometers, Optical alignment, Diffraction, Optical design, Sensors, Multiplexing, Monochromatic aberrations

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Proceedings Article | 17 April 2014 Paper

Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Iacopo Mochi, Senajith Rekawa, Arnaud Allezy, Michael Dickinson, Carl Cork, Weilun Chao, Daniel Zehm, James Macdougall, Patrick Naulleau, Anne Rudack

Proceedings Volume 9048, 90480Y (2014) https://doi.org/10.1117/12.2048364

KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Lithographic illumination, Mirrors, Fiber optic illuminators, Coherence (optics), Lenses, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 20 September 2013 Paper

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Kenneth Goldberg, Iacopo Mochi, Markus Benk, Chihcheng Lin, Arnaud Allezy, Michael Dickinson, Carl Cork, James Macdougall, Erik Anderson, Weilun Chao, Farhad Salmassi, Eric Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael Jones, Elizabeth Martin, Patrick Naulleau, Senajith Rekawa

Proceedings Volume 8880, 88800T (2013) https://doi.org/10.1117/12.2026496

KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Coherence (optics), Reticles, Mirrors, Lithographic illumination, Coherence imaging, Optical proximity correction, Diffraction

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Proceedings Article | 1 April 2013 Paper

Commissioning an EUV mask microscope for lithography generations reaching 8 nm

Kenneth Goldberg, Iacopo Mochi, Markus Benk, Arnaud Allezy, Michael Dickinson, Carl Cork, Daniel Zehm, James Macdougall, Erik Anderson, Farhad Salmassi, Weilun Chao, Vamsi Vytla, Eric Gullikson, Jason DePonte, M. S. Gideon Jones, Douglas Van Camp, Jeffrey Gamsby, William Ghiorso, Hanjing Huang, William Cork, Elizabeth Martin, Eric Van Every, Eric Acome, Veljko Milanovic, Rene Delano, Patrick Naulleau, Senajith Rekawa

Proceedings Volume 8679, 867919 (2013) https://doi.org/10.1117/12.2011688

KEYWORDS: Photomasks, Mirrors, Microscopes, Extreme ultraviolet, Fiber optic illuminators, Lenses, Reflectivity, Charge-coupled devices, Coating, Extreme ultraviolet lithography

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Showing 5 of 6 publications

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