Michael R. Dickinson
Engineering Technical Supervisor at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 23 March 2020 Presentation + Paper
Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 11323, 113230B (2020) https://doi.org/10.1117/12.2552125
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Proceedings Article | 26 March 2019 Presentation + Paper
Christopher Anderson, Arnaud Allezy, Weilun Chao, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Stephen Meyers, Ryan Miyakawa, Patrick Naulleau, Senajith Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 10957, 1095708 (2019) https://doi.org/10.1117/12.2516339
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

Proceedings Article | 26 March 2019 Paper
Ryan Miyakawa, Chris Anderson, Wenhua Zhu, Geoff Gaines, Jeff Gamsby, Carl Cork, Gideon Jones, Michael Dickenson, Seno Rekawa, Weilun Chao, Sharon Oh, Patrick Naulleau
Proceedings Volume 10957, 109571X (2019) https://doi.org/10.1117/12.2516384
KEYWORDS: Wavefronts, Diffraction gratings, Interferometry, Shearing interferometers, Optical alignment, Diffraction, Optical design, Sensors, Multiplexing, Monochromatic aberrations

Proceedings Article | 17 April 2014 Paper
Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Iacopo Mochi, Senajith Rekawa, Arnaud Allezy, Michael Dickinson, Carl Cork, Weilun Chao, Daniel Zehm, James Macdougall, Patrick Naulleau, Anne Rudack
Proceedings Volume 9048, 90480Y (2014) https://doi.org/10.1117/12.2048364
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Lithographic illumination, Mirrors, Fiber optic illuminators, Coherence (optics), Lenses, Extreme ultraviolet lithography, Lithography

Proceedings Article | 20 September 2013 Paper
Kenneth Goldberg, Iacopo Mochi, Markus Benk, Chihcheng Lin, Arnaud Allezy, Michael Dickinson, Carl Cork, James Macdougall, Erik Anderson, Weilun Chao, Farhad Salmassi, Eric Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael Jones, Elizabeth Martin, Patrick Naulleau, Senajith Rekawa
Proceedings Volume 8880, 88800T (2013) https://doi.org/10.1117/12.2026496
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Coherence (optics), Reticles, Mirrors, Lithographic illumination, Coherence imaging, Optical proximity correction, Diffraction

Showing 5 of 6 publications
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