CONFERENCE PROCEEDINGS
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Michihiro Kawaguchi
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Publications (4)
Proceedings Article | 12 November 2024 Presentation + Paper
Recent advancement and future plans on electron multi-beam mask writers
Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Kenichi Yasui, Hiroshi Matsumoto, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito
Proceedings Volume 13216, 1321617 (2024) https://doi.org/10.1117/12.3034512
KEYWORDS: Extreme ultraviolet, Beam path, Industry, Glasses, Resolution enhancement technologies, Semiconductors, Scanners, Quartz, Photoresist processing, Optical systems
Proceedings Article | 18 September 2024 Paper
Recent progress of multi-beam mask writer MBM-3000
Issei Aibara, Hiroshi Matsumoto, Jumpei Yasuda, Ken-ichi Yasui, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito, Noriaki Nakayamada
Proceedings Volume 13273, 132730O (2024) https://doi.org/10.1117/12.3028706
KEYWORDS: Industry, Extreme ultraviolet, Design, Singular optics, Semiconducting wafers, Optical lithography, Optical design, Glasses, Extreme ultraviolet lithography, Deep ultraviolet
Proceedings Article | 26 August 2024 Paper
Recent advancements of multibeam mask writer MBM-3000
Moeka Oshiro, Jumpei Yasuda, Hiroshi Matsumoto, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada
Proceedings Volume 13177, 131770U (2024) https://doi.org/10.1117/12.3034396
KEYWORDS: Beam path, Optical systems, Industry, Glasses, Extreme ultraviolet, Resolution enhancement technologies, Semiconductors, Scanners, Optical lithography, Optical design
Proceedings Article | 21 November 2023 Presentation + Paper
Multi-beam mask writer MBM-3000 for next generation EUV mask production
Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, Noriaki Nakayamada
Proceedings Volume 12751, 127510X (2023) https://doi.org/10.1117/12.2687415
KEYWORDS: Extreme ultraviolet, Electron beam lithography, Projection lithography, Resolution enhancement technologies, Distortion, Mask making
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