Dr. Mihir Gupta
at imec
SPIE Involvement:
Author
Area of Expertise:
EUV lithography materials , Biosensing
Websites:
Profile Summary

Mihir Gupta is a researcher at imec in the Exploratory Patterning Materials group, working on material and metrology research for EUV lithography. He obtained his PhD in Physics from KU Leuven, Belgium in 2021, where he worked on FinFET based electrical sensing of bio-molecules (DNA and proteins). He obtained his master's degree in Microelectronics from Nanyang Technological University (NTU) - Technische Universität München (TUM), Singapore in 2015, and his bachelor's degree in Electronics Engineering from Rajasthan Technical University, India.
Publications (13)

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13216, 1321604 (2024) https://doi.org/10.1117/12.3047176
KEYWORDS: Metals, Optical lithography, Logic, Semiconducting wafers, Extreme ultraviolet lithography, Etching, Scanning electron microscopy, Lithography, Tin

Proceedings Article | 12 November 2024 Presentation + Paper
Balakumar Baskaran, Mohamed Saib, Bojja Aditya Reddy, Matteo Beggiato, Mihir Gupta, Christophe Beral, Anne-Laure Charley, Gian Lorusso, Joost Bekaert, Philippe Leray
Proceedings Volume 13216, 132160Z (2024) https://doi.org/10.1117/12.3035709
KEYWORDS: Semiconducting wafers, Design, Scanning electron microscopy, Printing, Etching, Metrology, Matrices, Bridges, Extreme ultraviolet

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150K (2024) https://doi.org/10.1117/12.3034646
KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Directed self assembly, Photoresist developing, Reticles, Photoresist materials, Line width roughness, Semiconducting wafers, Line edge roughness

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150M (2024) https://doi.org/10.1117/12.3034575
KEYWORDS: Extreme ultraviolet lithography, Film thickness, Bubbles, Molecular bridges, Line width roughness, Bridges, Silica, Adhesion, Metal oxides, Extreme ultraviolet

SPIE Journal Paper | 9 September 2024
Seonggil Heo, Seungjoo Baek, Mihir Gupta, Hyo Seon Suh, Kodai Kato, Satoshi Takeda, Wataru Shibayama, Rikimaru Sakamoto
JM3, Vol. 23, Issue 03, 034603, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.3.034603
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Bridges, Capillaries, Photoresist developing, Windows, Photoresist processing, Etching, Photoresist materials, Dry etching

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Proceedings Article | 9 April 2024 Presentation + Paper
Seonggil Heo, Seungjoo Baek, Mihir Gupta, Hyo Seon Suh, Kodai Kato, Satoshi Takeda, Wataru Shibayama, Rikimaru Sakamoto
Proceedings Volume 12957, 1295710 (2024) https://doi.org/10.1117/12.3011118
KEYWORDS: Semiconducting wafers, Windows, Bridges, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Photoresist materials, Metal oxides, Image processing, Capillaries

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 124980R (2023) https://doi.org/10.1117/12.2660376
KEYWORDS: Film thickness, Extreme ultraviolet lithography, Etching, Adhesion, Line width roughness, Line edge roughness, Surface roughness, Lithography, Interfaces

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939
KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

Proceedings Article | 30 April 2023 Presentation
Hyo Seon Suh, Danilo De Simone, Christophe Beral, Mihir Gupta, Nadia Vandenbroeck, Anuja De Silva, Ali Haider, Ching-Chung Huang, Mohand Brouri, Francesco Gullo, Shruti Jambaldinni, Benjamin Kam, Hicham Zaid, Elisseos Verveniotis, Samantha Tan, Tim Weidman, Jengyi Yu, Da Li, Jun Xue, Younghee Lee
Proceedings Volume 12498, 1249803 (2023) https://doi.org/10.1117/12.2661652
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Materials processing, Interfaces

Proceedings Article | 26 May 2022 Presentation + Paper
Mihir Gupta, Paulina Rincon Delgadillo, Hyo Seon Suh, Sandip Halder, Mircea Dusa
Proceedings Volume 12053, 120530Q (2022) https://doi.org/10.1117/12.2616679
KEYWORDS: Critical dimension metrology, Statistical analysis, Scanning electron microscopy, Optical inspection, Materials processing, Inspection, Image processing, Metrology, Lithography

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12055, 1205507 (2022) https://doi.org/10.1117/12.2616094
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photo decomposable quencher, Chemistry, Silicon, Photoresist processing, Photoresist materials

Proceedings Article | 19 October 2021 Presentation + Paper
Proceedings Volume 11854, 118540Z (2021) https://doi.org/10.1117/12.2602034
KEYWORDS: Photomasks, Semiconducting wafers, Etching, Atomic force microscopy, Scanning electron microscopy, Bridges, Stochastic processes, Lithography, Extreme ultraviolet, Inspection

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top