We utilised thermal and UV-assisted Nanoimprint Lithography (NIL) i.e. thermal and UV-assisted to produce plasmonic coloration, and compare their ability for scalable fabrication. Several designs are presented and we show the generated colors are dependent on their geometry and the direction of polarisation of incident illumination. Finally, we demonstrated UV-NIL for consistent production of large-area (0.6×0.4 cm2) plasmonic color with extended color gamut.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.