Ms. Noriko IIDA Profile

Noriko IIDA

at Toshiba Corporation

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Publications (2)

Proceedings Article | 10 May 2016 Paper

Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width

Noriko Iida, Kosuke Takai, Takashi Kamo, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 9984, 99840E (2016) https://doi.org/10.1117/12.2242872

KEYWORDS: Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Photomasks, Multilayers, Transmission electron microscopy, Image processing, Photoresist processing, Scanning electron microscopy, Radon

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Proceedings Article | 23 October 2015 Paper

Process capability of etched multilayer EUV mask

Kosuke Takai, Noriko Iida nee Sakurai, Takashi Kamo, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 9635, 96351C (2015) https://doi.org/10.1117/12.2197686

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Mask cleaning, Multilayers, Transmission electron microscopy, Image processing, Reflectivity, Inspection, Particles, Neodymium

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