Dong-Hoon Chung
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 13 July 2017 Paper
Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo
Proceedings Volume 10454, 104540J (2017) https://doi.org/10.1117/12.2282406
KEYWORDS: Databases, Photomasks, Lithography, Inspection, Data processing

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963520 (2015) https://doi.org/10.1117/12.2202511
KEYWORDS: Inspection, Photomasks, Defect inspection, Liquids, Coating, Image processing, Neodymium, Extreme ultraviolet, Semiconducting wafers, Optical properties

Proceedings Article | 16 September 2014 Paper
Ute Buttgereit, Thomas Trautzsch, Min-ho Kim, Jung-Uk Seo, Young-Keun Yoon, Hak-Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Gary Meyers
Proceedings Volume 9235, 92350B (2014) https://doi.org/10.1117/12.2065937
KEYWORDS: Computed tomography, Image processing, Critical dimension metrology, Logic devices, Optical proximity correction, Image analysis, Photomasks, Metrology, Logic, Printing

Proceedings Article | 28 July 2014 Paper
Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, Soichi Shida, Takayuki Nakamura
Proceedings Volume 9256, 92560D (2014) https://doi.org/10.1117/12.2069368
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Metrology, Semiconductors, Error analysis, Optical proximity correction, Reliability, Tolerancing, Lithography

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8886, 88860O (2013) https://doi.org/10.1117/12.2030976
KEYWORDS: Inspection, Photomasks, SRAF, Printing, Source mask optimization, Calibration, Model-based design, Scanners, Lithography, Image processing

Proceedings Article | 28 June 2013 Paper
Jihoon Na, Sang Hoon Han, Gisung Yoon, Dong Hoon Chung, Byung-Gook Kim, Chanuk Jeon, Dana Bernstein, Lior Shoval, Ido Dolev, Ofer Shopen, Ju Sang Lee, Chung ki Lyu, Seung Ryong Bae
Proceedings Volume 8701, 870115 (2013) https://doi.org/10.1117/12.2032774
KEYWORDS: Photomasks, Inspection, Printing, Deep ultraviolet, Signal to noise ratio, Defect detection, Semiconducting wafers, Optical inspection, Wafer-level optics, Geometrical optics

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220M (2012) https://doi.org/10.1117/12.964964
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Polarization, Printing, Modulation, Lithographic illumination, Scanning electron microscopy

Proceedings Article | 14 October 2011 Paper
Jaehyuck Choi, Han-shin Lee, Jinsang Yoon, Takeya Shimomura, Alex Friz, Cecilia Montgomery, Andy Ma, Frank Goodwin, Daehyuk Kang, Paul Chung, Inkyun Shin, H. Cho
Proceedings Volume 8166, 81661M (2011) https://doi.org/10.1117/12.896836
KEYWORDS: Photomasks, Scanning probe microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Ruthenium, Optical lithography, Surface roughness, Reflectivity, Deep ultraviolet, Cadmium

Proceedings Article | 2 April 2011 Paper
Sang Hoon Han, Jihoon Na, Wonil Cho, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho, Dana Bernstein, Eun Young Park, Anoop Sreenath, Shmoolik Mangan
Proceedings Volume 7985, 79850V (2011) https://doi.org/10.1117/12.895209
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Signal to noise ratio, Optical inspection, Lithography, Scanners, Manufacturing, Semiconducting wafers

Proceedings Article | 29 October 2010 Paper
Dana Bernstein, Eun Young Park, Asaf Jaffe, Nir Shoshani, Ziv Parizat, Shmoolik Mangan, Sang Hoon Han, Dong Hoon Chung
Proceedings Volume 7823, 782335 (2010) https://doi.org/10.1117/12.866155
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Image enhancement, Defect detection, Optical inspection, Deep ultraviolet, Signal detection, Semiconductors

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782334 (2010) https://doi.org/10.1117/12.866017
KEYWORDS: Inspection, Photomasks, Sensors, Extreme ultraviolet lithography, Image processing, Defect detection, Image quality, Image sensors, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74882Q (2009) https://doi.org/10.1117/12.830139
KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74882S (2009) https://doi.org/10.1117/12.830032
KEYWORDS: Inspection, SRAF, Optical proximity correction, Artificial intelligence, Defect detection, Semiconducting wafers, Photomasks, Reticles, Model-based design, Image resolution

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 748809 (2009) https://doi.org/10.1117/12.830034
KEYWORDS: Photomasks, Inspection, Defect inspection, Lithography, SRAF, Image classification, Wafer-level optics, Semiconducting wafers, Defect detection, Scanning electron microscopy

Proceedings Article | 11 May 2009 Paper
Won-Sun Kim, Dong-Hoon Chung, Chan-Uk Jeon, HanKu Cho, William Huang, John Miller, Gregg Inderhees, Becky Pinto, Jiuk Hur, Kihun Park, Jay Han
Proceedings Volume 7379, 73791C (2009) https://doi.org/10.1117/12.824289
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Wafer inspection, Reticles, SRAF, Optical proximity correction, Lithography, Contamination, Image resolution

Proceedings Article | 17 October 2008 Paper
Kyung-Yoon Bang, Jin-Back Park, Jeong-Hun Roh, Dong-Hoon Chung, Sung-Yong Cho, Yong-Hoon Kim, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 7122, 71222V (2008) https://doi.org/10.1117/12.801416
KEYWORDS: Critical dimension metrology, Chromium, Scatterometry, Ultraviolet radiation, Scanning electron microscopy, Optical testing, Scatter measurement, Atomic force microscopy, Process control, Binary data

Proceedings Article | 19 May 2008 Paper
Hyun Joo Baik, Dong Hoon Chung, Yong Hoon Kim, Han Ku Cho, Amir Sagiv, Shmoolik Mangan, Ziv Parizat, Eun Young Park, Yaniv Brami, Dana Bernstein
Proceedings Volume 7028, 70281G (2008) https://doi.org/10.1117/12.793057
KEYWORDS: Inspection, Airborne remote sensing, Photomasks, Critical dimension metrology, Signal detection, Semiconducting wafers, Sensors, Printing, Optical lithography, Defect detection

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67303O (2007) https://doi.org/10.1117/12.747180
KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

Proceedings Article | 30 October 2007 Paper
Hyung-Joo Lee, So-Yoon Bae, Dong-Hoon Chung, Sang-Gyun Woo, HanKu Cho, Jun Matsumoto, Takayuki Nakamura, Dong Il Shin, TaeJun Kim
Proceedings Volume 6730, 673037 (2007) https://doi.org/10.1117/12.746453
KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Semiconducting wafers, Resolution enhancement technologies, Edge detection, Semiconductors, Optical metrology, Detection and tracking algorithms, Lithography

Proceedings Article | 25 October 2007 Paper
Proceedings Volume 6730, 673024 (2007) https://doi.org/10.1117/12.746567
KEYWORDS: Inspection, SRAF, Photomasks, Reticles, Optical proximity correction, Defect inspection, Databases, Opacity, Semiconducting wafers, Defect detection

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 660717 (2007) https://doi.org/10.1117/12.728956
KEYWORDS: Inspection, Lamps, Photomasks, Deep ultraviolet, Defect detection, SRAF, Particles, Defect inspection, Manufacturing, Resolution enhancement technologies

Proceedings Article | 20 October 2006 Paper
Do Young Kim, Seong Yong Cho, Hun Kim, Sung Min Huh, Dong Hoon Chung, Byung Chul Cha, Jung Woo Lee, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Eun Ji Kim, Zhengyu Guo, Ellen Quach, David Gee, Tom Brown, Aditya Dayal
Proceedings Volume 6349, 63492L (2006) https://doi.org/10.1117/12.686488
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Extreme ultraviolet lithography, Deep ultraviolet, Reticles, Defect detection, Binary data, Current controlled current source

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830Z (2006) https://doi.org/10.1117/12.681858
KEYWORDS: Inspection, Photomasks, Defect inspection, Defect detection, Mask making, Image processing, Manufacturing, Deep ultraviolet, Telecommunications, Semiconductors

Proceedings Article | 4 November 2005 Paper
Proceedings Volume 5992, 599205 (2005) https://doi.org/10.1117/12.632335
KEYWORDS: Inspection, Photomasks, Defect detection, Deep ultraviolet, Manufacturing, Semiconducting wafers, Resolution enhancement technologies, Optics manufacturing, Lithography, Defect inspection

Proceedings Article | 4 November 2005 Paper
Proceedings Volume 5992, 599209 (2005) https://doi.org/10.1117/12.632338
KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

Proceedings Article | 6 December 2004 Paper
Toru Tojo, Ryoich Hirano, Hideo Tsuchiya, Junji Oaki, Takeshi Nishizaka, Yasushi Sanada, Kazuto Matsuki, Ikunao Isomura, Riki Ogawa, Noboru Kobayashi, Kazuhiro Nakashima, Shinji Sugihara, Hiromu Inoue, Shinichi Imai, Hitoshi Suzuki, Akihiko Sekine, Makoto Taya, Akemi Miwa, Nobuyuki Yoshioka, Katsumi Ohira, Dong-Hoon Chung, Masao Otaki
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579133
KEYWORDS: Inspection, Photomasks, Sensors, Image sensors, Defect detection, Algorithm development, Speckle, Modulation transfer functions, Image processing, Optical inspection

Proceedings Article | 6 December 2004 Paper
Dong-Hoon Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578592
KEYWORDS: Photomasks, Inspection, Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies, Defect detection, Defect inspection, SRAF, Optical inspection

Proceedings Article | 20 August 2004 Paper
Dong-Hoon Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557726
KEYWORDS: Photomasks, Inspection, Lithography, Optical proximity correction, SRAF, Defect inspection, Optical lithography, Optical inspection, Defect detection, Resolution enhancement technologies

Proceedings Article | 20 August 2004 Paper
Katsumi Ohira, Dong Hoon Chung, Yoshioka Nobuyuki, Motonari Tateno, Kenichi Matsumura, Jiunn-Hung Chen, Gerard Luk-Pat, Norio Fukui, Yoshio Tanaka
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557734
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Computer simulations, Image processing, Image quality, Classification systems, Defect inspection, Resolution enhancement technologies, Deep ultraviolet

Proceedings Article | 28 August 2003 Paper
Sungmin Huh, JoHyung Park, Dong-Hoon Chung, Chang-Hwan Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504395
KEYWORDS: Photomasks, Inspection, Quartz, Dry etching, Finite-difference time-domain method, Lithography, Defect inspection, Semiconducting wafers, Mask making, Defect detection

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504280
KEYWORDS: Photomasks, Nanoimprint lithography, Logic, Phase shifts, Lithography, Manufacturing, Scanners, Semiconducting wafers, Logic devices, Scanning electron microscopy

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485406
KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Manufacturing, Chlorine, Lithography, Scanners, Semiconducting wafers, Quartz, Scanning electron microscopy

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467504
KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Lithography, Scanners, Surface plasmons, Scanning electron microscopy, Manufacturing, Quartz, Semiconducting wafers

Proceedings Article | 27 December 2002 Paper
Sung-Hyuck Kim, Dong-Hoon Chung, Ji-Soong Park, In-Kyun Shin, Seong-woon Choi, Jung-Min Sohn, Jae-Han Lee, Hye-Soo Shin, J. Fung Chen, Douglas Van Den Broeke
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468097
KEYWORDS: Photomasks, Camera shutters, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Chromium, Lithography, Wafer-level optics, Phase shifts, Printing

Proceedings Article | 1 August 2002 Paper
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476959
KEYWORDS: Photomasks, Quartz, Etching, Inspection, Manufacturing, Dry etching, Binary data, Resolution enhancement technologies, Optics manufacturing, Lithography

Proceedings Article | 30 July 2002 Paper
Dong-Hoon Chung, Jean-Young Park, Man-Ki Lee, In-Gyun Shin, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, J. Fung Chen, Douglas Van Den Broeke
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474534
KEYWORDS: Etching, Photomasks, Quartz, Inspection, Dry etching, Resolution enhancement technologies, Manufacturing, Mask making, Optical lithography, Lithography

Proceedings Article | 11 March 2002 Paper
Tae Moon Jeong, In-Gyun Shin, Dong-Hoon Chung, Sung-Hyuck Kim, Hyoungdo Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458361
KEYWORDS: Critical dimension metrology, Photomasks, Etching, Phase shifts, Optical lithography, Chromium, Manufacturing, Optics manufacturing, Semiconducting wafers, Wet etching

Proceedings Article | 14 September 2001 Paper
Sung-Woo Lee, Dong-Hoon Chung, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435775
KEYWORDS: Cadmium, Photomasks, Optical lithography, Tolerancing, Lithography, Phase shifts, Resolution enhancement technologies, Phase measurement, Quartz, Etching

Proceedings Article | 5 September 2001 Paper
Dong-Hoon Chung, Seung-Hune Yang, Hyung-Do Kim, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438343
KEYWORDS: Photomasks, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Optical lithography, Image enhancement, Image processing, Diffusion, Semiconductors, Mask making

Showing 5 of 39 publications
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