Mr. Robin L. Teitzel Profile

Robin L. Teitzel

Senior Electronics Manager at Murlea Technology LLC

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Author

Publications (6)

Proceedings Article | 16 June 2005 Paper

ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam

Paul Allen, Mike Bohan, Eric Christenson, H. Dai, M. Duane, H. Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637280

KEYWORDS: Semiconducting wafers, Photomasks, Metals, Reticles, Deep ultraviolet, Optical proximity correction, Manufacturing, Electron beam lithography, Lithography, Control systems

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Proceedings Article | 6 December 2004 Paper

Next-generation DUV ALTA mask patterning capabilities

Paul Allen, Michael Bohan, Eric Christenson, H. Christopher Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White, Michael Ungureit, Alan Wickstrom, Robert Kiefer, Curt Jackson

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570291

KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Reticles, Lithography, Vestigial sideband modulation, Signal detection, Artificial intelligence, Servomechanisms, Mirrors

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Proceedings Article | 20 August 2004 Paper

DUV ALTA system aerial image enhancement for improved pattern fidelity: phase II

Michael Ungureit, Samuel Howells, T. Chabreck, J. Hubbard, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Andrew Berwick, B. Skyborg, Paul Allen, Cris Morgante, Michael White

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557806

KEYWORDS: Artificial intelligence, Image enhancement, Evolutionary algorithms, Vestigial sideband modulation, Photomasks, Optical proximity correction, Deep ultraviolet, Scanning electron microscopy, Metals, Field programmable gate arrays

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Proceedings Article | 17 December 2003 Paper

DUV ALTA system aerial image enhancement for improved pattern fidelity

Paul Allen, Alex Buxbaum, Samuel Howells, Boaz Kenan, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Michael White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518218

KEYWORDS: Artificial intelligence, Image enhancement, Photomasks, Vestigial sideband modulation, Scanning electron microscopy, Optical proximity correction, Deep ultraviolet, Evolutionary algorithms, Manufacturing, Data conversion

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Proceedings Article | 22 January 2001 Paper

Lithographic performance results for a new 50-kV electron-beam mask writer

Varoujan Chakarian, Stephen Bylciw, Charles Sauer, David Trost, Marek Zywno, Robin Teitzel, Frederick Raymond, Frank Abboud

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410672

KEYWORDS: Photomasks, Lithography, Electron beam lithography, RGB color model, Control systems, Composites, Optical proximity correction, Binary data, Raster graphics, Modulation

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Proceedings Article | 19 July 2000 Paper

Elements of an advanced pattern generator for 130- to 100-nm maskmaking

Varoujan Chakarian, Charles Sauer, Bassam Shamoun, Frank Chilese, David Trost, Marek Zywno, Ulrich Hofmann, Robin Teitzel, Richard Prior, Frederick Raymond, Abe Ghanbari, Frank Abboud

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392094

KEYWORDS: Photomasks, Lithography, Control systems, Electron beam lithography, Critical dimension metrology, Raster graphics, Reticles, Binary data, Line edge roughness, RGB color model

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Showing 5 of 6 publications

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