Mr. Roy White Profile

Roy White

General Manager at White Consulting

SPIE Involvement:

Author

Area of Expertise:

Yield and Operations Improvement , Cost Analysis and Reduction , Crisis & Change Management , Project, Program, and Product Management , Analyzing and Solving Complex Problems , Product Development and Marketing

Websites:

Personal Website | Company Website

Profile Summary

Dynamic, focused, and results-driven team leader and motivator with proven record of generating superior results through strategically directing product and process operations. Analytical and creative thinker adept at synchronizing and interpreting complex data. Polished communicator. Confident and effective problem solver.

Over 22 years of process, product, and operations improvement experience at multiple levels within Forbes 500 companies, start-ups, and government agencies. Strong interests in capital equipment, photovoltaics (particularly CIGS), and M&A.

Publications (33)

Proceedings Article | 17 October 2014 Paper

Paper

Qualification of local advanced cryogenic cleaning technology for 14nm photomask fabrication

Ralf Taumer, Thorsten Krome, Chuck Bowers, Ivin Varghese, Tyler Hopkins, Roy White, Martin Brunner, Daniel Yi

Proceedings Volume 9235, 923525 (2014) https://doi.org/10.1117/12.2074473

KEYWORDS: Carbon dioxide, Cryogenics, Diffractive optical elements, Raster graphics, Photomasks, Particles, Scanning electron microscopy, Contamination, SRAF, Mask cleaning

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Proceedings Article | 1 April 2013 Paper

Paper

Through-focus EUV multilayer defect repair with nanomachining

Gregory McIntyre, Emily Gallagher, Tod Robinson, Adam Smith, Mark Lawliss, Jeffrey LeClaire, Ron Bozak, Roy White, Michael Archuletta

Proceedings Volume 8679, 86791I (2013) https://doi.org/10.1117/12.2014935

KEYWORDS: Photomasks, Extreme ultraviolet, Atomic force microscopy, Inspection, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts, Manufacturing, Calibration

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Proceedings Article | 8 November 2012 Paper

Paper

EUVL mask repair: expanding options with nanomachining

Emily Gallagher, Gregory McIntyre, Mark Lawliss, Tod Robinson, Ronald Bozak, Roy White, Jeff LeClaire

Proceedings Volume 8522, 85221L (2012) https://doi.org/10.1117/12.974749

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Atomic force microscopy, Near field, Manufacturing, Reflectivity, Inspection, Semiconducting wafers

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Proceedings Article | 30 June 2012 Paper

Paper

Applications and development of BitClean technology including selective nanoparticle manipulation

Tod Robinson, David Brinkley, Roy White, Jeff LeClaire, Michael Archuletta, Ron Bozak, Daniel Yi

Proceedings Volume 8441, 84410E (2012) https://doi.org/10.1117/12.964959

KEYWORDS: Nanoparticles, Photomasks, Particles, Inspection, Atomic force microscopy, Contamination, Mathematical modeling, Nanotechnology, Defect inspection, Metrology

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Proceedings Article | 17 April 2012 Paper

Paper

Through pellicle management of haze formation in a wafer fabrication environment

Alexander Figliolini, Michael Archuletta, Jeff LeClaire, David Brinkley, David Doerr, Roy White, Ron Bozak, David Lee

Proceedings Volume 8352, 83520R (2012) https://doi.org/10.1117/12.918378

KEYWORDS: Air contamination, Photomasks, Pellicles, Particles, Reticles, Semiconducting wafers, Image processing, Lithography, Inspection, Quartz

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Proceedings Article | 14 October 2011 Paper

Paper

Productivity of femtosecond DUV laser photomask repair in a real world mask house

Jin-Hong Lin, C. Chen, F. G. Tsai, Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta

Proceedings Volume 8166, 81662X (2011) https://doi.org/10.1117/12.898502

KEYWORDS: Photomasks, Deep ultraviolet, Opacity, Pellicles, Femtosecond phenomena, Quartz, Image transmission, Critical dimension metrology, Manufacturing, Chromium

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Proceedings Article | 14 October 2011 Paper

Paper

Nanomachining repair for the latest reticle enhancement technologies

Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, Bernie Arruza

Proceedings Volume 8166, 81662Y (2011) https://doi.org/10.1117/12.898504

KEYWORDS: Photomasks, Atomic force microscopy, Source mask optimization, Manufacturing, Reticles, Lithography, Computational lithography, Optimization (mathematics), Opacity, Resolution enhancement technologies

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Proceedings Article | 14 October 2011 Paper

Paper

Clean and repair of EUV photomasks

Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, David Lee

Proceedings Volume 8166, 81661J (2011) https://doi.org/10.1117/12.898503

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Lithography, Cryogenics, Data modeling, Nanoparticles, Nanotechnology, Autoregressive models

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Proceedings Article | 25 September 2010 Paper

Paper

Advanced laser mask repair in the current wafer foundry environment

Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta

Proceedings Volume 7823, 782320 (2010) https://doi.org/10.1117/12.864426

KEYWORDS: Photomasks, Deep ultraviolet, Pellicles, Particles, Laser applications, Inspection, Semiconducting wafers, Femtosecond phenomena, Critical dimension metrology, Contamination

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Proceedings Article | 25 September 2010 Paper

Paper

Qualification of BitClean technology in photomask production

Tod Robinson, Roy White, Ron Bozak, Mike Archuletta, David Brinkley, Daniel Yi

Proceedings Volume 7823, 782326 (2010) https://doi.org/10.1117/12.864381

KEYWORDS: Particles, Photomasks, Atomic force microscopy, Contamination, Nanoparticles, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Inspection

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Proceedings Article | 27 May 2010 Paper

Paper

Nanomachining of non-orthogonal mask patterns

Tod Robinson, Daniel Yi, Roy White, Ron Bozak, Mike Archuletta, David Lee

Proceedings Volume 7748, 77481H (2010) https://doi.org/10.1117/12.865198

KEYWORDS: Photomasks, Autoregressive models, Lithography, Bridges, Quartz, Nanotechnology, Standards development, Edge detection, Software development, Human-machine interfaces

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Proceedings Article | 25 May 2010 Paper

Paper

Through-pellicle defect repair for advanced photomasks

Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, David Lee

Proceedings Volume 7748, 77480G (2010) https://doi.org/10.1117/12.865197

KEYWORDS: Photomasks, Pellicles, Chromium, Deep ultraviolet, Nanoparticles, Inspection, Scanning electron microscopy, Laser development, Particles, Defect inspection

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Proceedings Article | 2 April 2010 Paper

Paper

Preliminary results for photomask haze mitigation in a fab environment

Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Michael Archuletta, David Lee

Proceedings Volume 7638, 763817 (2010) https://doi.org/10.1117/12.848283

KEYWORDS: Photomasks, Air contamination, Semiconducting wafers, Reticles, Inspection, Pellicles, Contamination, Manufacturing, Deep ultraviolet, Critical dimension metrology

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Proceedings Article | 23 September 2009 Paper

Paper

New tools to enable photomask repair to the 32nm node

Tod Robinson, Roy White, Ron Bozak, Ken Roessler, Bernie Arruza, Dennis Hogle, Mike Archuletta, David Lee

Proceedings Volume 7488, 74880F (2009) https://doi.org/10.1117/12.847238

KEYWORDS: Photomasks, Atomic force microscopy, Nanotechnology, Chromium, Binary data, Extreme ultraviolet, Cryogenics, Molecular bridges, Environmental monitoring

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Proceedings Article | 11 May 2009 Paper

Paper

Selective removal of persistent particles with no photomask damage

Tod Robinson, Ron Bozak, Roy White, Mike Archuletta, David Lee

Proceedings Volume 7379, 73791J (2009) https://doi.org/10.1117/12.824296

KEYWORDS: Particles, Photomasks, Contamination, Nanoparticles, Atomic force microscopy, Manufacturing, Inspection, Quartz, Scanning electron microscopy, Air contamination

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Proceedings Article | 17 October 2008 Paper

Paper

Practical laser mask repair in the contemporary production environment

Tod Robinson, Roy White, Mike Archuletta, Ron Bozak

Proceedings Volume 7122, 71221J (2008) https://doi.org/10.1117/12.801301

KEYWORDS: Pellicles, Deep ultraviolet, Photomasks, Scanning electron microscopy, Bridges, Particles, Airborne remote sensing, Quartz, Inspection, Metrology

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Proceedings Article | 17 October 2008 Paper

Paper

Nanomachining photomask repair of complex patterns

Tod Robinson, Andrew Dinsdale, Mike Archuletta, Ron Bozak, Roy White

Proceedings Volume 7122, 71221I (2008) https://doi.org/10.1117/12.801297

KEYWORDS: Photomasks, Optical proximity correction, Atomic force microscopy, Extreme ultraviolet, Cryogenics, Scanning electron microscopy, Lithography, Nanotechnology, Metrology, Autoregressive models

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Proceedings Article | 19 May 2008 Paper

Paper

Nanomachining processes for 45, 32 nm node mask repair and beyond

Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, Michael Archuletta

Proceedings Volume 7028, 70281A (2008) https://doi.org/10.1117/12.793052

KEYWORDS: Particles, Photomasks, Cryogenics, Chromium, Scanning electron microscopy, Atomic force microscopy, Binary data, Image processing, Optical proximity correction, Particle contamination

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Proceedings Article | 30 October 2007 Paper

Paper

Repairing 45 nm node defects through nano-machining

Roy White, Andrew Dinsdale, Tod Robinson, David Brinkley, Jeffrey Csuy, David Lee

Proceedings Volume 6730, 673021 (2007) https://doi.org/10.1117/12.748668

KEYWORDS: Diamond, Atomic force microscopy, Image processing, Quartz, Scanning electron microscopy, Photomasks, Diamond machining, Standards development, Autoregressive models, Chromium

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Proceedings Article | 20 October 2006 Paper

Paper

Precise and high-throughput femtopulse laser mask repair of large defects

Roy White, Jeff LeClaire, Tod Robinson, Andrew Dinsdale, Ron Bozak, David Lee

Proceedings Volume 6349, 63494F (2006) https://doi.org/10.1117/12.686361

KEYWORDS: Deep ultraviolet, Laser ablation, Femtosecond phenomena, Chromium, Quartz, Critical dimension metrology, Photomasks, Pulsed laser operation, Microscopes, Image transmission

Read Abstract +

As mask complexity has increased and design rules continued to shrink, the manufacturing cost per mask has steadily increased as well. Studies also show that defects are the number one issue for mask yield. Smaller defects are typically addressed through process development, or through photomask repair. The occurrence of large defects often may only be further reduced through use of expensive clean room improvements, like SMIF handling systems. The impact of each large defect therefore increases while the feasibility in their repair decreases as they can span a large number of adjoining densely packed patterns. The presence of sub-resolution features such as scatter bars and the increasing use of embedded phase-shifting masks also complicates the timely repair of such defects. Existing mask repair techniques such as nanomachining, electron beam, or focused ion beam are challenged to produce high yield repairs on such large defects within a reasonable timeframe. Often very complex repairs may in fact take longer than a rewrite of the mask! Deep UV (DUV) femtosecond pulse laser mask repair provides a unique solution to this defect repair need. Methods and results are discussed for the process optimization for the removal of large (5μm) area repair on both Cr and MoSi absorber films on quartz. Additionally, high repair throughput results are shown for unknown contamination removal, and reproduction of ≥1 μm complex unconnected patterns in a single repair run lasting a matter of minutes. Closed-loop CD feedback in-situ with the iterative repair process for such structures can readily result in an edge placement control within ±15 nm. Prior iterative CD closed-loop repairs on specific structures have reliably yielded results within ±10 nm, as confirmed by AIMS CD error, even after aggressive mask wet clean. The nanometer scale dimensional resolution and repeatability of such repairs is shown with the use of sub-pixel resolution automated pattern reconstruction using integrated high-NA DUV microscope imaging.

Proceedings Article | 20 May 2006 Paper

Paper

Femtopulse laser-based mask repair in the DUV wavelength regime

Firoz Ghadiali, Vikram Tolani, Rajesh Nagpal, Tod Robinson, Jeff LeClaire, Ron Bozak, David Lee, Roy White

Proceedings Volume 6283, 628329 (2006) https://doi.org/10.1117/12.681779

KEYWORDS: Laser ablation, Deep ultraviolet, Electrons, Photomasks, Femtosecond phenomena, Chromium, Pulsed laser operation, Microscopes, Critical dimension metrology, Absorption

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Proceedings Article | 9 November 2005 Paper

Paper

Mask repair for the 65nm technology node

Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, David Lee, Ken Roessler

Proceedings Volume 5992, 59924Z (2005) https://doi.org/10.1117/12.634758

KEYWORDS: Photomasks, Chromium, Atomic force microscopy, Statistical analysis, Binary data, Quartz, Feedback control, Control systems, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 6 December 2004 Paper

Paper

Inspection and repair issues for Step and Flash Imprint Lithography templates

Kevin Nordquist, William Dauksher, David Mancini, Douglas Resnick, Harald Hess, Donald Pettibone, David Adler, Kirk Bertsche, Roy White, Jeffrey Csuy, David Lee

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569846

KEYWORDS: Inspection, Scanning electron microscopy, Photomasks, Semiconducting wafers, Oxides, Lithography, Etching, Deep ultraviolet, Quartz, Atomic force microscopy

Read Abstract +

Step and Flash Imprint Lithography (S-FIL) 1X templates must eventually achieve and maintain the very low defect counts commensurate to current production masks. This requires typically fewer than ten or even no defects over the entire field and to minimize template fabrication costs and techniques must be identified to repair defects on templates when they do occur. We describe inspection and repair methodologies and how it can be applied to the imprint template. For inspection, test patterns etched onto the template enable both a die-to-die comparison, to find nuisance defects, and also calibration of sensitivity to different types of preprogrammed defects. A state of the art deep UV photomask inspection system (KLA-Tencor model 526) can detect these events with about 70 nm threshold for imprint masks using reflection mode contrast. Initial scans are made at various stages of the imprint process: the processed mask, after dicing, and after several imprints. The scans show mostly isolated point defects at a density of ~ 10 to 100 per mm². To repair defects, studies were undertaken using RAVE’s nm650 tool which is essentially an AFM platform that relies upon a nano-machining technique for opaque defect removal. On S-FIL templates, the standard deviation for depth repairs in quartz from the target depth was found to be 3.1 nm (1σ). The spread in edge placement data for opaque line protrusions was 21.5 nm (1σ). Trench cuts through lines were successfully created with a minimum size of about 55nm. The repairs on the template were verified by imprinting the features on wafers. The range of depth offsets studied (-15 to +15) had no bearing on the imprinting process and the edge placement on wafers replicated the edge placement of the repaired templates. Trench cuts on the template were successfully filled with the imprint monomer and measured slightly larger than the minimum gap size. Finally, the imprinted wafers were used to pattern transfer features into 100nm of oxide.

Proceedings Article | 20 August 2004 Paper

Paper

Correlation of inspection methods in characterizing nanomachined photomask repairs

Jeffrey Csuy, Ron Bozak, Lee Terrill, Roy White, Naoki Nishida

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557736

KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Atomic force microscopy, Image analysis, Optical testing, Metrology, Manufacturing, Atomic force microscope, Optics manufacturing

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Proceedings Article | 17 December 2003 Paper

Paper

Optimization of nanomachining repair condition for ArF lithography

Tsuyoshi Amano, Masaharu Nishiguchi, Hiroyuki Hashimoto, Yasutaka Morikawa, Naoya Hayashi, Roy White, Ron Bozak, Lee Terrill

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518025

KEYWORDS: Binary data, Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Cadmium, Quartz, Scanning electron microscopy, NOx, Printing

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Proceedings Article | 28 August 2003 Paper

Paper

Defect repair performance using the nanomachining repair technique

Yasutaka Morikawa, Haruo Kokubo, Masaharu Nishiguchi, Naoya Hayashi, Roy White, Ron Bozak, Lee Terrill

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504213

KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Binary data, Printing, Bridges, Cadmium, Image transmission, 193nm lithography, Manufacturing

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Proceedings Article | 28 May 2003 Paper

Paper

Use of nanomachining for 100-nm mask repair

Bob LoBianco, Roy White, Ted Nawrocki

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515088

KEYWORDS: Photomasks, Quartz, Phase shifts, Image processing, Atomic force microscopy, Head, Navigation systems, Cryogenics, Binary data, Glasses

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Proceedings Article | 27 December 2002 Paper

Paper

Use of nanomachining for 100-nm mask repair

Bob LoBianco, Roy White, Ted Nawrocki

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468628

KEYWORDS: Photomasks, Quartz, Phase shifts, Atomic force microscopy, Image processing, Head, Navigation systems, Cryogenics, Bridges

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Proceedings Article | 27 December 2002 Paper

Paper

Investigation of nanomachining as a technique for geometry reconstruction

David Brinkley, Ron Bozak, Bin Chiu, Chanh Ly, Vikram Tolani, Roy White

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468275

KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Phase shifts, Wafer testing, Cadmium, Semiconductors, Atomic force microscope, Head, Ion beams

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Proceedings Article | 16 August 2002 Paper

Paper

High-precision mask repair using nanomachining

Martin Verbeek, Roy White, Marty Klos

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479356

KEYWORDS: Quartz, Phase shifting, Carbon, Photomasks, Particles, Opacity, Binary data, Glasses, Atomic force microscopy, Scanning electron microscopy

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Proceedings Article | 1 August 2002 Paper

Paper

Use of nanomachining for subtractive repair of EUV and other challenging mask defects

David Brinkley, Roy White, Ron Bozak, Ted Liang, Gang Liu

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476998

KEYWORDS: Photomasks, Extreme ultraviolet, Carbon, Contamination, Atomic force microscopy, Image processing, Quartz, Etching, Reflectivity, Phase shifts

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Proceedings Article | 11 March 2002 Paper

Paper

Use of nanomachining as a technique to reduce scrap of high-end photomasks

Roy White, Martin Verbeek, Ron Bozak, Marty Klos

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458294

KEYWORDS: Photomasks, Quartz, Atomic force microscopy, Bridges, Image processing, Phase shifts, Carbon, Image transmission, Semiconductors, Head

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Proceedings Article | 12 February 1997 Paper

Paper

Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology

Mark Raphaelian, Don Carolan, J. David Casey, Andrew Doyle, M. Ellis, David Ferranti, Joshua Lessing, K. Rose, Diane Stewart, Roy White

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301220

KEYWORDS: Photomasks, Opacity, Carbon, Calibration, Ion beams, Statistical analysis, Standards development, Semiconducting wafers, Phase shifting, Phase shifts

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Showing 5 of 33 publications

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