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Sam K. Doran
Independent Contractor
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Publications (1)
Proceedings Article | 28 March 2014 Paper
Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate
James Smith, Nigel Crosland, Samuel Doran, Robert Dowling, John Hartley, Philip Hoyle, David M. King, Lawrence Kutcher, Andrew McClelland, Martin Turnidge
Proceedings Volume 9049, 90490O (2014) https://doi.org/10.1117/12.2046609
KEYWORDS: Lithography, Double patterning technology, Analog electronics, Clocks, Photomicroscopy, Beam shaping, Computer programming, Semiconducting wafers, Metals, Metrology
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