Shu-Ping Fang
Principal Engineer at United Microelectronics Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 17 May 2005 Paper
Hsien-an Chang, Benjamin Szu-Min Lin, Kuei-Chun Hung, Shu-Ping Fang, Te-shao Hsu
Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.599321
KEYWORDS: Deep ultraviolet, Critical dimension metrology, Annealing, Oxides, Double patterning technology, Integrated circuits, Chemical reactions, Process control, Astatine, Microelectronics

Proceedings Article | 12 May 2005 Paper
Shu Fang, Hsiang Yang, Hsien-an Chang, Paul Chiang, Benjamin Lin, Kuei-Chun Hung
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598707
KEYWORDS: Lithography, Photomasks, Lithographic illumination, Optical lithography, Logic devices, Optical resolution, Photoresist materials, Manufacturing, Printing, Airborne remote sensing

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534641
KEYWORDS: 193nm lithography, Lithography, Line edge roughness, Optical lithography, Chromium, Coherence (optics), Image processing, Resolution enhancement technologies, Photoresist materials, Optical proximity correction

Proceedings Article | 24 May 2004 Paper
Mike Yeh, Shu-Ping Fang, Bo-Jau Tsau, Chih-Chung Huang, Benjamin Lin, Steven Fu, Jay Chen, Regina Freed, Ted Dziura, Mike Slessor
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536269
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Metrology, Etching, Spectroscopic ellipsometry, Cadmium, Scanning electron microscopy, Transistors, Atomic force microscopy, Single crystal X-ray diffraction

Proceedings Article | 29 April 2004 Paper
Shu-Ping Fang, Benjamin Lin, Kuei-Chun Hung
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.535046
KEYWORDS: Lithography, Scanners, Back end of line, Copper, Optical proximity correction, Semiconducting wafers, Manufacturing, Photomasks, Inspection, Critical dimension metrology

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