Dr. Shuhui Kang Profile

Dr. Shuhui Kang

at National Institute of Standards and Technology

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Author

Publications (10)

Proceedings Article | 1 April 2009 Paper

Characterization of the photoacid diffusion length

Shuhui Kang, Vivek Prabhu, Wen-li Wu, Eric Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh

Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555

KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 15 April 2008 Paper

A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists

Shuhui Kang, Kristopher Lavery, Kwang-Woo Choi, Vivek Prabhu, Wen-Li Wu, Eric Lin, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018

KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

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Proceedings Article | 3 April 2008 Paper

Characterization of the latent image to developed image in model EUV photoresists

John Woodward, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036

KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

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Proceedings Article | 5 April 2007 Paper

Characterizing pattern structures using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Wook Ro, Shuhui Kang, Eric Lin, Alamgir Karim, Wen-li Wu, D. Hines

Proceedings Volume 6518, 651813 (2007) https://doi.org/10.1117/12.712416

KEYWORDS: X-rays, Reflectivity, Silicon, Data modeling, Metrology, X-ray sources, Scattering, Nanoimprint lithography, Lithography, Laser scattering

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Proceedings Article | 3 April 2007 Paper

FTIR measurements of compositional heterogeneities

Shuhui Kang, Bryan Vogt, Wen-li Wu, Vivek Prabhu, David VanderHart, Ashwin Rao, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 651916 (2007) https://doi.org/10.1117/12.712659

KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

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Proceedings Article | 22 March 2007 Paper

Direct measurement of the in-situ developed latent image: the residual swelling fraction

Vivek Prabhu, Bryan Vogt, Shuhui Kang, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest

Proceedings Volume 6519, 651910 (2007) https://doi.org/10.1117/12.712311

KEYWORDS: Polymers, Reflectivity, Interfaces, Scattering, Photoresist materials, Photoresist developing, Silicon, X-rays, In situ metrology, Standards development

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Proceedings Article | 22 March 2007 Paper

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

Shuhui Kang, Wen-Li Wu, Vivek Prabhu, Bryan Vogt, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 65193V (2007) https://doi.org/10.1117/12.712682

KEYWORDS: Line edge roughness, Switches, Diffusion, Photoresist materials, Optical spheres, Polymers, 3D modeling, Computer simulations, Photoresist developing, Standards development

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Proceedings Article | 29 March 2006 Paper

Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Shuhui Kang, Vivek Prabhu, Bryan Vogt, Eric Lin, Wen-Li Wu, Karen Turnquest

Proceedings Volume 6153, 61533N (2006) https://doi.org/10.1117/12.656594

KEYWORDS: Polymers, Photoresist materials, Diffusion, FT-IR spectroscopy, Data modeling, Glasses, Ultraviolet radiation, Spectroscopy, Chemical reactions, Hydrogen

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Proceedings Article | 29 March 2006 Paper

The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists

Bryan Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest, Wen-li Wu

Proceedings Volume 6153, 615316 (2006) https://doi.org/10.1117/12.656464

KEYWORDS: FT-IR spectroscopy, Diffusion, Reflectivity, Line edge roughness, Photoresist materials, Image quality, Image processing, Standards development, Polymers, Scattering

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Proceedings Article | 29 March 2006 Paper

Dissolution fundamentals of 193-nm methacrylate-based photoresists

Ashwin Rao, Shuhui Kang, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-Li Wu, Karen Turnquest, William Hinsberg

Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540

KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

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Showing 5 of 10 publications

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