Shunsuke Koshihara
at Hitachi High-Tech Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (21)

SPIE Journal Paper | 12 September 2018
Gian Francesco Lorusso, Takumichi Sutani, Vito Rutigliani, Frieda van Roey, Alain Moussa, Anne-Laure Charley, Chris Mack, Patrick Naulleau, Chami Perera, Vassilios Constantoudis, Masami Ikota, Toru Ishimoto, Shunsuke Koshihara
JM3, Vol. 17, Issue 04, 041009, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041009
KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

Proceedings Article | 28 March 2018 Presentation + Paper
Gian Francesco Lorusso, Takumichi Sutani , Vito Rutigliani, Frieda van Roey, Alain Moussa, Anne-Laure Charley, Chris Mack, Patrick Naulleau, Vassilios Constantoudis , Masami Ikota , Toru Ishimoto, Shunsuke Koshihara
Proceedings Volume 10585, 105850D (2018) https://doi.org/10.1117/12.2294617
KEYWORDS: Line width roughness, Metrology, Standards development, Semiconductors, Scanning electron microscopy, Image acquisition, Atomic force microscopy, Finite element methods, Semiconducting wafers, Time metrology

Proceedings Article | 19 March 2018 Presentation
Hyo Seon Suh, Akhil Nair, Paulina Rincon Delgadillo, Jan Doise, Gian Lorusso, Paul Nealey, Victor Monreal, Durairaj Baskaran, Yi Cao, Munirathna Padmanaban, Jin Li, Takeshi Kato, Takumichi Sutani, Toru Ishimoto, Masami Ikota, Shunsuke Koshihara
Proceedings Volume 10586, 105860T (2018) https://doi.org/10.1117/12.2299496
KEYWORDS: Directed self assembly, Annealing, Nanolithography, Lithography, Thin film manufacturing, Thin films, Resolution enhancement technologies, High volume manufacturing, Polymethylmethacrylate, Temperature metrology

Proceedings Article | 28 March 2017 Presentation + Paper
Gian Francesco Lorusso, Takeyoshi Ohashi, Astuko Yamaguchi, Osamu Inoue, Takumichi Sutani, Naoto Horiguchi, Jürgen Bömmels, Christopher Wilson, Basoene Briggs, Chi Lim Tan, Tom Raymaekers, Romain Delhougne, Geert Van den Bosch, Luca Di Piazza, Gouri Sankar Kar, Arnaud Furnémont, Andrea Fantini, Gabriele Luca Donadio, Laurent Souriau, Davide Crotti, Farrukh Yasin, Raf Appeltans, Siddharth Rao, Danilo De Simone, Paulina Rincon Delgadillo, Philippe Leray, Anne-Laure Charley, Daisy Zhou, Anabela Veloso, Nadine Collaert, Kazuhisa Hasumi, Shunsuke Koshihara, Masami Ikota, Yutaka Okagawa, Toru Ishimoto
Proceedings Volume 10145, 1014512 (2017) https://doi.org/10.1117/12.2257468
KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, 3D metrology, Back end of line, Logic, Standards development, Germanium, Algorithm development, Process control, Resistance, Overlay metrology, Oxides, Etching, Statistical analysis

SPIE Journal Paper | 12 October 2016
Nobuhiro Okai, Erin Lavigne, Keiichiro Hitomi, Scott Halle, Shoji Hotta, Shunsuke Koshihara, Atsuko Yamaguchi, Junichi Tanaka, Todd Bailey
JM3, Vol. 15, Issue 04, 044001, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.044001
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

Showing 5 of 21 publications
Conference Committee Involvement (13)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 13 Conference Committees
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