Dr. TaeGeun Seong Profile

Dr. TaeGeun Seong

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Proceedings Article | 27 March 2017 Presentation + Paper

Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

Frederic Lazzarino, Sara Paolillo, Anthony Peter, David De Roest, TaeGeun Seong, Yizhi Wu, Stefan Decoster, Vito Rutigliani, Gian Francesco Lorusso, Vassilios Constantoudis, Sven Van Elshocht, Daniele Piumi, Kathy Barla

Proceedings Volume 10146, 101460K (2017) https://doi.org/10.1117/12.2258040

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Photoresist materials, Metals, Extreme ultraviolet, Double patterning technology, Back end of line, Semiconductors, High volume manufacturing, Line edge roughness, Chemistry, Argon, Plasma, Semiconducting wafers, Surface roughness, Line width roughness, FT-IR spectroscopy

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