Mr. Takashi Ryu Profile

Takashi Ryu

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Proceedings Article | 12 November 2024 Presentation + Paper

Evaluation of ultra-thin membrane for EUV pellicles using metal core materials

Takashi Tanimura, Toshikatsu Kashiwaya, Shoji Tange, Yasuaki Tanaka, Hiroki Iida, Tetsuro Yoshioka, Koichi Masuda, Takashi Ryu

Proceedings Volume 13215, 132150C (2024) https://doi.org/10.1117/12.3034662

KEYWORDS: Extreme ultraviolet, Pellicles, Beryllium, Transmittance, Extreme ultraviolet lithography, Metals, Hydrogen, Manufacturing, Semiconducting wafers, Prototyping

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It has been several years since EUV lithography technology was introduced to advanced semiconductor manufacturing, and the production use of EUV pellicles also has recently been promoted. To maximize production yield and throughput, higher EUV transmittance and lifetime performance are required. To meet these requirements, NGK has initiated the development of pellicle membranes made of beryllium metal. In this presentation, we introduce the prototype manufacturing and evaluation results of a free-standing beryllium core membrane. Beryllium, a light metal, has long been used as a material for X-ray transmission. Additionally, beryllium possesses high stiffness and excellent heat dissipation properties, making it a strong candidate to meet the high-performance requirements as an EUV pellicle material. NGK is one of the few companies worldwide capable of manufacturing beryllium products and has succeeded in producing the world's first large, ultra-thin, free-standing beryllium core membrane. We manufactured and evaluated the ultra-thin membrane, achieving greater than 90% EUV transmittance. The membrane’s lifetime (durability) was also assessed under conditions equivalent to 600W EUV power (30W/cm2) in a hydrogen atmosphere, with the pellicle membrane withstanding EUV irradiation for more than 50,000 wafers. Additionally, regarding the toxicity of beryllium, which is generally a concern, we have confirmed that it meets international safety standards.

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