Dr. Takehiro Seshimo Profile

Dr. Takehiro Seshimo

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 30 April 2023 Presentation

Chemically tailored block copolymers based on polystyrene-b-polymethacrylates for DSA patterning

Teruaki Hayakawa, Shinsuke Maekawa, Yuta Nabae, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato

Proceedings Volume PC12497, PC124970G (2023) https://doi.org/10.1117/12.2662125

KEYWORDS: Optical lithography, Transmission electron microscopy, Thin films, Scanning electron microscopy, Lithography, Annealing, X-rays, X-ray microscopy, Scattering, Polymerization

Read Abstract +

Proceedings Article | 13 June 2022 Presentation

Strongly-segregating chemically tailored polystyrene-b-polymethacrylates for sub-10 nm patterning

Teruaki Hayakawa, Shinsuke Maekawa, Yasunari Yoshimura, Lei Dong, Yuta Nabae, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato

Proceedings Volume PC12054, PC1205406 (2022) https://doi.org/10.1117/12.2618062

KEYWORDS: Optical lithography, Thin films, Scanning electron microscopy, Annealing, Transmission electron microscopy, Lithography, X-rays, X-ray microscopy, Scattering, Polymerization

Read Abstract +

Proceedings Article | 13 March 2018 Paper

Desirable material selection on self-aligned multi-patterning

Kyohei Koike, Kazuki Yamada, Masatoshi Yamato, Hidetami Yaegashi, Takehiro Seshimo, Takahiro Dazai, Katsumi Ohmori

Proceedings Volume 10586, 105861F (2018) https://doi.org/10.1117/12.2297297

KEYWORDS: Carbon, Silicon, Etching, Polymers, System on a chip, Scanning electron microscopy, Silicon carbide, Oxides, Reactive ion etching, Optical lithography

Read Abstract +

Proceedings Article | 1 April 2016 Paper

Directed self-assembly of Si-containing and topcoat free block copolymer

Tasuku Matsumiya, Takehiro Seshimo, Tsuyoshi Kurosawa, Hitoshi Yamano, Ken Miyagi, Tomotaka Yamada, Katsumi Ohmori

Proceedings Volume 9777, 97771P (2016) https://doi.org/10.1117/12.2218243

KEYWORDS: Directed self assembly, Annealing, Thin films, Etching, Lithography, Optical lithography, Manufacturing, Semiconductors, Polymers, Control systems, Silicon, Dry etching, Nitrogen, Scanning electron microscopy

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Guided self-assembly of Si-containing block copolymer with a topcoat surface treatment

Takehiro Seshimo, Yoshiyuki Utsumi, Takahiro Dazai, Takaya Maehashi, Katsumi Ohmori

Proceedings Volume 9049, 90490X (2014) https://doi.org/10.1117/12.2046270

KEYWORDS: Silicon, Etching, Optical lithography, Annealing, Polymers, Coating, Lithography, Resistance, Polymerization, Directed self assembly

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Photobase generator enabled pitch division: a progress report

Xinyu Gu, Younjin Cho, Takanori Kawakami, Yuji Hagiwara, Brandon Rawlings, Ryan Mesch, Toshiyuki Ogata, Taeho Kim, Takehiro Seshimo, Wade Wang, Arun Sundaresan, Nicholas Turro, Roel Gronheid, James Blackwell, Robert Bristol, C. Grant Willson

Proceedings Volume 7972, 79720F (2011) https://doi.org/10.1117/12.879861

KEYWORDS: Line edge roughness, Polymers, Lithography, Diffusion, Optical lithography, Photomasks, Chemical analysis, Scanning electron microscopy, Absorbance, Chemistry

Read Abstract +

Proceedings Article | 1 April 2009 Paper

A study of the photo acid generator material design for chemically amplified photoresists

Y. Utsumi, T. Seshimo, Y. Komuro, A. Kawaue, K. Ishiduka, K. Matsuzawa, Hideo Hada, J. Onodera

Proceedings Volume 7273, 72732F (2009) https://doi.org/10.1117/12.815190

KEYWORDS: Diffusion, Lithography, Polymers, Semiconducting wafers, Molecular interactions, Photoresist materials, Sensors, Hydrogen, Silicon, Chemically amplified resists

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years