Dr. Timothy A. Brunner
Principle Application Engineer
SPIE Involvement:
Author
Area of Expertise:
microlithography , optical lithography , process control , IC production lithography
Profile Summary

Since 1980, I have been working in the area of lithographic patterning for IC production - a most fascinating, interdisciplinary area. Some particular interests include advanced image formation, simulation, process control, metrology methods, data analysis, and EUV lithography.
I have a B.A. from Carleton College in 1975 and a doctorate from MIT in 1980, both in physics. Before joining ASML in 2019, I worked for GLOBALFOUNDRIES, IBM, Xerox PARC and Perkin-Elmer Corporation.
Publications (83)

SPIE Journal Paper | 8 October 2024 Open Access
JM3, Vol. 24, Issue 01, 011002, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011002
KEYWORDS: Photomasks, Light sources and illumination, Surface plasmons, Semiconducting wafers, Resolution enhancement technologies, Source mask optimization, Nanoimprint lithography, Near field, Diffraction, Lithography

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295302 (2024) https://doi.org/10.1117/12.3009996
KEYWORDS: Photomasks, Light sources and illumination, Source mask optimization, Lithography, Near field, Diffraction

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275006 (2023) https://doi.org/10.1117/12.2685543
KEYWORDS: Semiconducting wafers, Stochastic processes, Nanoimprint lithography, Printing, Line width roughness, Simulations, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12292, 122920A (2022) https://doi.org/10.1117/12.2640647
KEYWORDS: Photoresist processing, Metrology, Stochastic processes, Extreme ultraviolet lithography, Lithographic process control

SPIE Journal Paper | 20 July 2022
JM3, Vol. 21, Issue 03, 030501, (July 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.3.030501
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Diffraction, Scanners, 3D image processing, Solids, Fiber optic illuminators, Switches

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205108 (2022) https://doi.org/10.1117/12.2614174
KEYWORDS: Extreme ultraviolet, Refractive index, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet lithography, Diffraction, 3D printing, 3D image processing

Proceedings Article | 29 September 2021 Presentation
Proceedings Volume 11854, 118540U (2021) https://doi.org/10.1117/12.2601243
KEYWORDS: Photomasks, Extreme ultraviolet, Diffraction, Refractive index, Systems modeling, Reflectivity, Phase shifts, Mirrors, Lithographic illumination, Extreme ultraviolet lithography

Proceedings Article | 22 February 2021 Presentation + Paper
Timothy Brunner, Jara Santaclara, Gerardo Bottiglieri, Chris Anderson, Patrick Naulleau
Proceedings Volume 11609, 1160906 (2021) https://doi.org/10.1117/12.2582751

Proceedings Article | 18 December 2020 Presentation + Paper
Proceedings Volume 11517, 115170Y (2020) https://doi.org/10.1117/12.2574450
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, EUV optics, Ion beams, Manufacturing

Proceedings Article | 14 April 2020 Presentation + Paper
Proceedings Volume 11323, 113231A (2020) https://doi.org/10.1117/12.2554493
KEYWORDS: Line width roughness, Photoresist materials, Photons, Scanners, Lithography, Line edge roughness, Convolution, Extreme ultraviolet lithography, Extreme ultraviolet, Stochastic processes

SPIE Journal Paper | 30 November 2018 Open Access
JM3, Vol. 17, Issue 04, 041000, (November 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041000
KEYWORDS: Stochastic processes, Optical lithography, Integrated circuits, Line edge roughness, Extreme ultraviolet lithography, Line width roughness, Metrology, Critical dimension metrology, Photomasks, Semiconducting wafers

Proceedings Article | 24 October 2018 Open Access Presentation + Paper
Proceedings Volume 10809, 1080903 (2018) https://doi.org/10.1117/12.2502791
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Chemically amplified resists, Optical lithography, Pellicles, Line edge roughness, Reliability, Contamination

Proceedings Article | 9 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090O (2018) https://doi.org/10.1117/12.2501863
KEYWORDS: Monochromatic aberrations, Extreme ultraviolet lithography, Critical dimension metrology, Wavefronts, Semiconducting wafers, Principal component analysis, Imaging systems, Metrology, Lithography, Detection and tracking algorithms

SPIE Journal Paper | 24 September 2018
Allen Gabor, Andrew Brendler, Timothy Brunner, Xuemei Chen, James Culp, Harry Levinson
JM3, Vol. 17, Issue 04, 041008, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041008
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

SPIE Journal Paper | 17 September 2018
Xuemei Chen, Erik Verduijn, Obert Wood, Timothy A. Brunner, Renzo Capelli, Dirk Hellweg, Martin Dietzel, Grizelda Kersteen
JM3, Vol. 17, Issue 04, 041012, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041012
KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

SPIE Journal Paper | 17 September 2018
JM3, Vol. 17, Issue 04, 041013, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041013
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

Proceedings Article | 30 March 2018 Presentation + Paper
Allen Gabor, Andrew Brendler, Timothy Brunner, Xuemei Chen, James Culp, Harry Levinson
Proceedings Volume 10583, 105830C (2018) https://doi.org/10.1117/12.2297459
KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Line edge roughness, Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

Proceedings Article | 27 March 2018 Presentation + Paper
Xuemei Chen, Erik Verduijn, Obert Wood, Timothy Brunner, Renzo Capelli, Dirk Hellweg, Martin Dietzel, Grizelda Kersteen
Proceedings Volume 10583, 105830J (2018) https://doi.org/10.1117/12.2297364
KEYWORDS: Line width roughness, Photomasks, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Stochastic processes, Extreme ultraviolet lithography, Speckle, Image processing, Scanners

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830I (2018) https://doi.org/10.1117/12.2299509
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Stochastic processes, Pellicles, Extreme ultraviolet, Scanning electron microscopy, Inspection, Extreme ultraviolet lithography, Lithography

Proceedings Article | 28 March 2017 Presentation + Paper
Proceedings Volume 10145, 101450Z (2017) https://doi.org/10.1117/12.2258602
KEYWORDS: Line scan image sensors, Line edge roughness, Statistical analysis, Image quality, Process control, Critical dimension metrology, Line width roughness, Extreme ultraviolet lithography, Correlation function, Computer simulations, Photoresist materials, Metrology, Edge roughness, Scanning electron microscopy, Edge detection, Lithography, Error analysis

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101431F (2017) https://doi.org/10.1117/12.2258642
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Error analysis, Lithographic illumination, Reticles, Overlay metrology, Distortion, Statistical analysis

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101430E (2017) https://doi.org/10.1117/12.2258660
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Failure analysis, 193nm lithography, Photons, Logic, Modulation, Line width roughness, Photomasks, Cadmium, Statistical analysis, Image quality

Proceedings Article | 24 March 2017 Presentation + Paper
Timothy Brunner, Melih Ozlem, Geng Han, Jed Rankin, Obert Wood, Erik Verduijn
Proceedings Volume 10143, 1014313 (2017) https://doi.org/10.1117/12.2258656
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Reflectivity, Multilayers, Coating, Molybdenum, Silicon, Pellicles, Semiconducting wafers, Scanning electron microscopy, Bridges, Reticles, Opacity, High volume manufacturing

SPIE Journal Paper | 2 May 2016
JM3, Vol. 15, Issue 02, 021406, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021406
KEYWORDS: Overlay metrology, Distortion, Scanners, Reticles, Image processing, Semiconducting wafers, Error analysis, Optical alignment, Photomasks, Calibration

Proceedings Article | 15 March 2016 Paper
Timothy Brunner, Yue Zhou, Cheuk W. Wong, Bradley Morgenfeld, Gerald Leino, Sunit Mahajan
Proceedings Volume 9780, 97800W (2016) https://doi.org/10.1117/12.2218630
KEYWORDS: Semiconducting wafers, Metrology, Lithography, Overlay metrology, Silicon, Error control coding, Distortion, Optical lithography, Process control, Data modeling, Oxides, Silicon films, Thin films

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942613 (2015) https://doi.org/10.1117/12.2085887
KEYWORDS: Overlay metrology, Scanners, Distortion, Reticles, Semiconducting wafers, Optical lithography, Photomasks, Optical alignment, Lithographic illumination, Error analysis

SPIE Journal Paper | 27 June 2014 Open Access
JM3, Vol. 13, Issue 02, 023014, (June 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023014
KEYWORDS: Photomasks, Phase shifts, SRAF, Semiconducting wafers, Lithography, Opacity, Optical lithography, Scattering, Binary data, Polarization

Proceedings Article | 31 March 2014 Paper
T. Brunner, V. Menon, C. Wong, N. Felix, M. Pike, O. Gluschenkov, M. Belyansky, P. Vukkadala, S. Veeraraghavan, S. Klein, C. H. Hoo, J. Sinha
Proceedings Volume 9052, 90520U (2014) https://doi.org/10.1117/12.2045715
KEYWORDS: Semiconducting wafers, Overlay metrology, Electronic support measures, Distortion, Optical alignment, Metrology, Photomasks, Lithography, Silicon, Laser range finders

SPIE Journal Paper | 25 October 2013 Open Access
Timothy Brunner, Vinayan Menon, Cheuk Wong, Oleg Gluschenkov, Michael Belyansky, Nelson Felix, Christopher Ausschnitt, Pradeep Vukkadala, Sathish Veeraraghavan, Jaydeep Sinha
JM3, Vol. 12, Issue 04, 043002, (October 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.043002
KEYWORDS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology

Proceedings Article | 10 April 2013 Paper
C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen
Proceedings Volume 8681, 868137 (2013) https://doi.org/10.1117/12.2009397
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Photomasks, Etching, Scatter measurement, Scanning electron microscopy, Lithography, Semiconductors

SPIE Journal Paper | 11 December 2012
JM3, Vol. 11, Issue 4, 043011, (December 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.4.043011
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Photoresist processing, Scatterometry, Electron microscopes, Metrology, Photomasks, Critical dimension metrology, Detection and tracking algorithms, Algorithm development

Proceedings Article | 14 March 2012 Paper
Obert Wood, John Arnold, Timothy Brunner, Martin Burkhardt, James H.-C. Chen, Deniz Civay, Susan S.-C. Fan, Emily Gallagher, Scott Halle, Ming He, Craig Higgins, Hirokazu Kato, Jongwook Kye, Chiew-Seng Koay, Guillaume Landie, Pak Leung, Gregory McIntyre, Satoshi Nagai, Karen Petrillo, Sudhar Raghunathan, Ralph Schlief, Lei Sun, Alfred Wagner, Tom Wallow, Yunpeng Yin, Xuelian Zhu, Matthew Colburn, Daniel Corliss, Cecilia Smolinski
Proceedings Volume 8322, 832203 (2012) https://doi.org/10.1117/12.916292
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Manufacturing, Lithography, Immersion lithography, Optical lithography, Metals, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2012 Paper
Proceedings Volume 8324, 832405 (2012) https://doi.org/10.1117/12.916413
KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Critical dimension metrology, Photomasks, Detection and tracking algorithms, Photoresist processing, Algorithm development, Process control, Lithography

Proceedings Article | 22 February 2012 Paper
Proceedings Volume 8326, 832607 (2012) https://doi.org/10.1117/12.916312
KEYWORDS: Reticles, Semiconducting wafers, Source mask optimization, Monochromatic aberrations, Lithography, Calibration, Photomasks, Critical dimension metrology, Device simulation, Overlay metrology

SPIE Journal Paper | 1 October 2010
Bernhard Liegl, Brian Sapp, Stephen Greco, Timothy Brunner, Nelson Felix, Ian Stobert, Kourosh Nafisi, Chandra Sarma
JM3, Vol. 9, Issue 04, 041311, (October 2010) https://doi.org/10.1117/12.10.1117/1.3530580
KEYWORDS: Semiconducting wafers, Scatterometry, Image processing, Scanners, Error analysis, Scatter measurement, Silicon, Metrology, Sensors, Lithography

SPIE Journal Paper | 1 October 2010
Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Hyang Kyun Kim, Michael Sendler, Stanislav Stepanov, Victor Kucerov
JM3, Vol. 9, Issue 04, 041306, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514707
KEYWORDS: Scatterometry, Semiconducting wafers, Optical properties, Critical dimension metrology, Optical testing, Finite element methods, Diffractive optical elements, Lithography, Data modeling, Metrology

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78230M (2010) https://doi.org/10.1117/12.865358
KEYWORDS: Photomasks, Semiconducting wafers, Reflectivity, Pellicles, Diffraction, Binary data, Stray light, Opacity, Polarization, Manufacturing

Proceedings Article | 2 April 2010 Paper
Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Helen Kim, Michael Sendler, Stanislav Stepanov, Victor Kucerov
Proceedings Volume 7638, 76381H (2010) https://doi.org/10.1117/12.846648
KEYWORDS: Scatterometry, Finite element methods, Semiconducting wafers, Optical properties, Critical dimension metrology, Diffractive optical elements, Metrology, Data modeling, Optical testing, Scatter measurement

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 763804 (2010) https://doi.org/10.1117/12.846694
KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Scanners, Scatterometry, Scanning electron microscopy, Optical lithography, Optical testing, Finite element methods, Edge roughness

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76400W (2010) https://doi.org/10.1117/12.846408
KEYWORDS: Overlay metrology, Monochromatic aberrations, Semiconducting wafers, Scanners, Double patterning technology, Reticles, Critical dimension metrology, Metrology, Data modeling, Distortion

Proceedings Article | 4 March 2010 Paper
Christopher Ausschnitt, Timothy Brunner, Nelson Felix, Blandine Minghetti
Proceedings Volume 7640, 76400U (2010) https://doi.org/10.1117/12.846847
KEYWORDS: Error analysis, Semiconducting wafers, Overlay metrology, Photomasks, Double patterning technology, Tolerancing, Lithography, Tin, Optical imaging, Optical lithography

Proceedings Article | 4 March 2010 Paper
Bernhard Liegl, Brian Sapp, Kia Low, Stephen Greco, Timothy Brunner, Nelson Felix, Ian Stobert, Kourosh Nafisi, Chandrasekhar Sarma
Proceedings Volume 7640, 76400Z (2010) https://doi.org/10.1117/12.846768
KEYWORDS: Semiconducting wafers, Scanners, Image processing, Sensors, Calibration, Imaging systems, Scatterometry, Silicon, Scatter measurement, Wafer-level optics

Proceedings Article | 23 March 2009 Paper
T. Wiltshire, D. Corliss, T. Brunner, C. Ausschnitt, R. Young, R. Nielson, E. Hwang, J. Iannucci
Proceedings Volume 7272, 72720W (2009) https://doi.org/10.1117/12.812287
KEYWORDS: Semiconducting wafers, Scatterometry, Lithography, Control systems, Scanners, Metrology, Deconvolution, Finite element methods, Manufacturing, Overlay metrology

Proceedings Article | 20 March 2009 Paper
Proceedings Volume 7271, 727121 (2009) https://doi.org/10.1117/12.816545
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Scatterometry, Extreme ultraviolet, Reticles, Overlay metrology, Metrology, Diffraction gratings

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740S (2009) https://doi.org/10.1117/12.812786
KEYWORDS: Semiconducting wafers, Reticles, Metrology, Resolution enhancement technologies, Critical dimension metrology, Data modeling, Immersion lithography, Finite element methods, Lithography, Deconvolution

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69241L (2008) https://doi.org/10.1117/12.773070
KEYWORDS: Critical dimension metrology, Tolerancing, Lithography, Photomasks, Scanners, Semiconducting wafers, Electroluminescence, Optical lithography, Error analysis, Reactive ion etching

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200K (2007) https://doi.org/10.1117/12.713277
KEYWORDS: Photomasks, SRAF, Lithography, Optical proximity correction, Photoresist processing, Metals, Lithographic illumination, Printing, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 26 March 2007 Paper
Christopher Ausschnitt, Timothy Brunner
Proceedings Volume 6520, 65200M (2007) https://doi.org/10.1117/12.712155
KEYWORDS: Semiconducting wafers, Lithography, Finite element methods, Image processing, Scatterometry, Process control, Critical dimension metrology, Scatter measurement, Optical lithography, Photomasks

Proceedings Article | 21 March 2007 Paper
A. Gabor, T. Brunner, S. Bukofsky, S. Butt, F. Clougherty, S. Deshpande, T. Faure, O. Gluschenkov, K. Greene, J. Johnson, N. Le, P. Lindo, A. Mahorowala, H-J. Nam, D. Onsongo, D. Poindexter, J. Rankin, N. Rohrer, S. Stiffler, A. Thomas, H. Utomo
Proceedings Volume 6521, 65210K (2007) https://doi.org/10.1117/12.711750
KEYWORDS: Critical dimension metrology, Diffusion, Lithography, Etching, Semiconducting wafers, Integrated circuits, Optical proximity correction, Cadmium, Manufacturing, Optical lithography

Proceedings Article | 15 March 2007 Paper
T. Brunner, C. Ausschnitt
Proceedings Volume 6518, 651803 (2007) https://doi.org/10.1117/12.712116
KEYWORDS: Semiconducting wafers, Photomasks, Optical proximity correction, Diffraction gratings, Critical dimension metrology, Data modeling, Manufacturing, Optical design, Scatterometry, Diffraction

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634947 (2006) https://doi.org/10.1117/12.686957
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Line edge roughness, Critical dimension metrology, Error analysis, Time metrology, Scanning electron microscopy, Microelectronics, Lithography

SPIE Journal Paper | 1 October 2006
Timothy Brunner, Daniel Corliss, Shahid Butt, Timothy Wiltshire, Christopher Ausschnitt, Mark Smith
JM3, Vol. 5, Issue 04, 043003, (October 2006) https://doi.org/10.1117/12.10.1117/1.2396926
KEYWORDS: Lithography, Optical proximity correction, Critical dimension metrology, Excimer lasers, Optical simulations, Colorimetry, Image processing, Semiconducting wafers, Photoresist processing, Imaging systems

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521L (2006) https://doi.org/10.1117/12.655729
KEYWORDS: Photomasks, Phase measurement, Phase shifts, Calibration, Diffraction, Diffraction gratings, Metrology, Attenuators, Polarization, Silica

Proceedings Article | 15 March 2006 Paper
T. Brunner, D. Corliss, S. Butt, T. Wiltshire, C. Ausschnitt, M. Smith
Proceedings Volume 6154, 61540V (2006) https://doi.org/10.1117/12.656520
KEYWORDS: Lithography, Optical proximity correction, Critical dimension metrology, SRAF, Excimer lasers, Colorimetry, Image processing, Semiconducting wafers, Imaging systems, Photoresist processing

Proceedings Article | 9 March 2006 Paper
Proceedings Volume 6154, 615405 (2006) https://doi.org/10.1117/12.656545
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Immersion lithography, Monte Carlo methods, Scanners, Photomasks, Optical proximity correction, Optical lithography, Lithography, Manufacturing

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598822
KEYWORDS: Photoresist processing, Photomasks, Semiconducting wafers, Image processing, Critical dimension metrology, Chemical reactions, Lithography, Optical proximity correction, Atomic force microscopy, Photoresist materials

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537447
KEYWORDS: Reticles, Critical dimension metrology, Photomasks, Binary data, Lithography, Scanners, Scanning electron microscopy, Phase shifts, Semiconducting wafers, Optical lithography

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544241
KEYWORDS: Photomasks, Opacity, Polarization, Reticles, Semiconducting wafers, Chromium, Lithography, Resolution enhancement technologies, SRAF, Diffraction

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537472
KEYWORDS: Modulation transfer functions, Optical proximity correction, Photomasks, Critical dimension metrology, Lithography, Spatial frequencies, Photoresist processing, Monte Carlo methods, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 28 August 2003 Paper
Jason Plumhoff, Chris Constantine, Jong Shin, B. Reelfs, Emmanuel Rausa, Jason Benz, Michael Hibbs, Timothy Brunner
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504198
KEYWORDS: Etching, Quartz, Photomasks, Image processing, Diffractive optical elements, Dry etching, Phase shifts, Surface roughness, Scanning electron microscopy, Chromium

Proceedings Article | 12 June 2003 Paper
Katherina Babich, Arpan Mahorowala, David Medeiros, Dirk Pfeiffer, Karen Petrillo, Marie Angelopoulos, Alfred Grill, Vishnubhai Patel, Scott Halle, Timothy Brunner, Richard Conti, Scott Allen, Richard Wise
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485174
KEYWORDS: Etching, Silicon, Reflectivity, Lithography, Plasma, Interfaces, Photoresist processing, Electron beam lithography, Plasma enhanced chemical vapor deposition, Image resolution

SPIE Journal Paper | 1 October 2002
JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1507337
KEYWORDS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474473
KEYWORDS: Polarization, Lithography, Reflectivity, Photoresist processing, Reflection, Interferometry, Image processing, Photoresist materials, Optics manufacturing, Semiconducting wafers

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474584
KEYWORDS: Etching, Photomasks, Phase shifting, Diffraction, Phase shifts, Quartz, Optical lithography, Microscopes, Fourier transforms, Reticles

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474233
KEYWORDS: Polarization, Scanning electron microscopy, Lithography, Photoresist materials, Interferometry, Systems modeling, Imaging spectroscopy, Electron microscopes, Antireflective coatings, Image acquisition

SPIE Journal Paper | 1 July 2002
Alfred Wong, Antoinette Molless, Timothy Brunner, Eric Coker, Robert Fair, George Mack, Scott Mansfield
JM3, Vol. 1, Issue 02, (July 2002) https://doi.org/10.1117/12.10.1117/1.1488159
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Spatial analysis, Optical lithography, Error analysis, Process control, Lithography, Resolution enhancement technologies

Proceedings Article | 14 September 2001 Paper
Allen Gabor, Timothy Brunner, Jia Chen, Norman Chen, Sadanand Deshpande, Richard Ferguson, David Horak, Steven Holmes, Lars Liebmann, Scott Mansfield, Antoinette Molless, Christopher Progler, Paul Rabidoux, Deborah Ryan, Peter Talvi, Len Tsou, Ben Vampatella, Alfred Wong, Qingyun Yang, Chienfan Yu
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435708
KEYWORDS: Reticles, Semiconducting wafers, Binary data, Lithography, Scanning electron microscopy, Critical dimension metrology, Scanners, Photomasks, Logic, Etching

Proceedings Article | 14 September 2001 Paper
Timothy Brunner, Allen Gabor, ChungHsi Wu, Nora Chen
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435726
KEYWORDS: Reflection, Critical dimension metrology, Reflectivity, Lithography, Silicon, Data modeling, Thin films, Fabry–Perot interferometers, Polarization, Solids

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436866
KEYWORDS: Photoresist processing, Image processing, Diffusion, Absorption, Lithography, Polonium, Solids, Photoresist developing, Optical lithography, Photoresist materials

Proceedings Article | 5 July 2000 Paper
Alfred Wong, Antoinette Molless, Timothy Brunner, Eric Coker, Robert Fair, George Mack, Scott Mansfield
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388994
KEYWORDS: Photomasks, Semiconducting wafers, Spatial analysis, Optical lithography, Critical dimension metrology, Photoresist developing, Photoresist materials, Metrology, Lithography, Lithographic illumination

Proceedings Article | 29 June 1998 Paper
Qinghuang Lin, Ahmad Katnani, Timothy Brunner, Charlotte DeWan, Cindy Fairchok, Douglas LaTulipe, John Simons, Karen Petrillo, Katherina Babich, David Seeger, Marie Angelopoulos, Ratnam Sooriyakumaran, Gregory Wallraff, Donald Hofer
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312417
KEYWORDS: Silicon, Reactive ion etching, Etching, Polymers, Photomasks, Lithography, Thin films, Line edge roughness, Optical lithography, Silicon films

Proceedings Article | 7 June 1996 Paper
Joseph Kirk, Timothy Brunner
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240915
KEYWORDS: Photoresist materials, Absorption, Image resolution, Atomic force microscopy, Optical lithography, Lithography, Image quality, Photoresist developing, Signal attenuation, 3D image processing

Proceedings Article | 7 June 1996 Paper
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240909
KEYWORDS: Calibration, Monochromatic aberrations, Semiconducting wafers, Photoresist processing, Overlay metrology, Lithography, Reticles, Phase shifts, Process control, Metrology

Proceedings Article | 7 June 1996 Paper
Timothy Brunner, Richard Ferguson
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240906
KEYWORDS: Photoresist processing, Image processing, Diffusion, Image segmentation, Absorption, Tolerancing, Computer simulations, X-ray optics, X-rays, Lithography

Proceedings Article | 26 May 1995 Paper
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209267
KEYWORDS: Photomasks, Etching, Scattering, Reactive ion etching, Semiconducting wafers, Quartz, Phase shifts, Error analysis, Fabrication, Mask making

Proceedings Article | 26 May 1995 Paper
Rebecca Mih, Alexander Martin, Timothy Brunner, David Long, Diane Brown
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209321
KEYWORDS: Semiconducting wafers, Monochromatic aberrations, Photomasks, Lithography, Overlay metrology, Process control, Reticles, Phase shifting, Data processing, Photoresist processing

Proceedings Article | 17 May 1994 Paper
Timothy Brunner, Alexander Martin, Ronald Martino, Christopher Ausschnitt, Thomas Newman, Michael Hibbs
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175449
KEYWORDS: Semiconducting wafers, Overlay metrology, Monochromatic aberrations, Photomasks, Metrology, Phase shifts, Lithography, Calibration, Image processing, Data acquisition

SPIE Journal Paper | 1 October 1993
OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.145956
KEYWORDS: Photomasks, Computer aided design, Spatial frequencies, Lithographic illumination, Lithography, Manufacturing, Image acquisition, Phase shifts, Photoresist processing, Optical lithography

Proceedings Article | 8 August 1993 Paper
Timothy Brunner, Pia Sanda, M. Wordeman, Tom Lii
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150423
KEYWORDS: Photomasks, Semiconducting wafers, Phase shifts, Photoresist processing, Lithography, Optical lithography, Scanning electron microscopy, Process control, Etching, Field effect transistors

Proceedings Article | 8 August 1993 Paper
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150474
KEYWORDS: Photomasks, Phase shifts, Optical lithography, Lithography, Spatial frequencies, Computer aided design, Lithographic illumination, Manufacturing, Photoresist processing, Printing

Proceedings Article | 1 June 1992 Paper
Steve Miura, Christopher Lyons, Timothy Brunner
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130316
KEYWORDS: Reflectivity, Absorption, Refractive index, Photoresist processing, Optical lithography, Etching, Thin films, Thin film coatings, Manufacturing, Control systems

Proceedings Article | 1 June 1991 Paper
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46410
KEYWORDS: Thin films, Reflection, Photoresist processing, Absorption, Photoresist materials, Reflectivity, Silicon, Oxides, Interfaces, Fabry–Perot interferometers

Proceedings Article | 1 June 1990 Paper
Timothy Brunner, James Lewis, Margaret Manny
Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20055
KEYWORDS: Reticles, Metrology, Semiconducting wafers, Integrated circuits, Inspection, Process control, Data modeling, Optical alignment, Sensors, Solids

Showing 5 of 83 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 26 May 1995

SPIE Conference Volume | 17 May 1994

Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
Intnl conference on electron, ion and photon beam tech and nanofabrication
31 May 2011 |
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
SPIE Advanced Lithography
22 February 2009 | San Jose, United States
SPIE Advanced Lithography
24 February 2008 | San Jose, United States
SPIE Advanced Lithography
25 February 2007 | San Jose, United States
SPIE 31st International Symposium on Advanced Lithography
19 February 2006 | San Jose, United States
23rd Annual International Symposium on Microlithography
22 February 1998 | Santa Clara, United States
Microlithography '97
10 March 1997 | Santa Clara, United States
SPIE's 1996 International Symposium on Microlithography
10 March 1996 | Santa Clara, United States
Optical/Laser Microlithography VIII
22 February 1995 | Santa Clara, CA, United States
Optical/Laser Microlithography VII
2 March 1994 | San Jose, CA, United States
Showing 5 of 15 Conference Committees
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