A technique for fabricating aperiodic Bragg gratings in rib waveguides on Silicon-On-Insulator (SOI) is presented. The technique allows flexibility in defining various characteristics of aperiodic gratings so that a full range of optical grating filters can be realized. The fabrication process comprises optical and electron-beam (e-beam) lithography followed by a liftoff and a single Reactive Ion Etch (RIE) to simultaneously produce the waveguide and the embedded grating structure.
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