Dr. Wen-Chuan Wang Profile

Dr. Wen-Chuan Wang

at Taiwan Semiconductor Mfg

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 19 March 2015 Paper

Thermal effect induced wafer deformation in high-energy e-beam lithography

P.S. Chen, W.C. Wang, S.J. Lin

Proceedings Volume 9423, 942310 (2015) https://doi.org/10.1117/12.2085100

KEYWORDS: Distortion, Thermal effects, Semiconducting wafers, Silicon carbide, Silicon, Finite element methods, Scattering, Thermal modeling, Electron beam lithography, Scanners

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Proceedings Article | 28 March 2014 Paper

The REBL DPG: recent innovations and remaining challenges

Allen Carroll, Luca Grella, Kirk Murray, Mark McCord, Paul Petric, William Tong, Christopher Bevis, Shy-Jay Lin, Tsung-Hsin Yu, Tze-Chiang Huang, T. Wang, Wen-Chuan Wang, J. Shin

Proceedings Volume 9049, 904917 (2014) https://doi.org/10.1117/12.2048528

KEYWORDS: Mirrors, Lithography, Semiconducting wafers, Error control coding, Reflectivity, Switching, Electrodes, Data compression, Printing, Electron beam lithography

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Proceedings Article | 21 March 2012 Paper

Reflective electron-beam lithography: progress toward high-throughput production capability

Regina Freed, Thomas Gubiotti, Jeff Sun, Francoise Kidwingira, Jason Yang, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis, Shy-Jay Lin, Wen-Chuan Wang

Proceedings Volume 8323, 83230H (2012) https://doi.org/10.1117/12.916090

KEYWORDS: Electron beam lithography, Semiconducting wafers, Electroluminescence, Lithography, Monte Carlo methods, Reflectivity, Electron beams, Direct write lithography, Silicon, Computer aided design

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Proceedings Article | 4 April 2011 Paper

Influence of massively parallel e-beam direct-write pixel size on electron proximity correction

S. J. Lin, P. S. Chen, J. J. Shin, W. C. Wang, Burn Lin

Proceedings Volume 7970, 79700Z (2011) https://doi.org/10.1117/12.869896

KEYWORDS: Raster graphics, Critical dimension metrology, Semiconducting wafers, Data transmission, Electron beam lithography, Tolerancing, Optical fibers, Maskless lithography, Electron beam direct write lithography, Mask making

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Proceedings Article | 3 April 2010 Paper

Characteristics performance of production-worthy multiple e-beam maskless lithography

S. Lin, W. Wang, P. Chen, C. Liu, T. Lo, Jack J. Chen, Faruk Krecinic, Burn Lin

Proceedings Volume 7637, 763717 (2010) https://doi.org/10.1117/12.848319

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Maskless lithography, Scattering, Electron beam lithography, Laser scattering, Electron beams, Image resolution, Electron beam direct write lithography, Manufacturing

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Proceedings Article | 12 December 2009 Paper

Imaging performance of production-worthy multiple-E-beam maskless lithography

S. J. Lin, W. C. Wang, Jack Chen, Faruk Krecinic, Burn Lin, Guido de Boer, Erwin Slot, Remco Jager, Stijn Steenbrink, Bert-Jan Kampherbeek, Marco Wieland

Proceedings Volume 7520, 752009 (2009) https://doi.org/10.1117/12.838573

KEYWORDS: Maskless lithography, Semiconducting wafers, Electron beam lithography, Line width roughness, Critical dimension metrology, Finite element methods, Manufacturing, Electron beams, Photomasks, Image resolution

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Proceedings Article | 11 May 2007 Paper

Improvement of etching selectivity for 32-nm node mask making

C. Lu, L. Hsia, T. Cheng, S. Chang, W. Wang, H. Lee, Y. Ku

Proceedings Volume 6607, 66070E (2007) https://doi.org/10.1117/12.728928

KEYWORDS: Etching, SRAF, Chromium, Diffractive optical elements, Photomasks, Plasma, Optical lithography, Line edge roughness, Mask making, Semiconducting wafers

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Proceedings Article | 17 December 2003 Paper

Global CD uniformity improvement in mask manufacturing for advanced lithography

Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Ren-Guey Hsieh, Cherng-Shyan Tsay, Yung-Sung Yen, Sheng-Chi Chin, Hsin-Chang Lee, Ru-Gun Liu, Kuei-Shun Chen, Hung-Chang Hsieh, Yao Ku, John Lin

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518008

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Manufacturing, Inspection, Etching, Software development, Semiconductor manufacturing, Control systems

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Proceedings Article | 17 December 2003 Paper

Mask pattern fidelity quantification

Wen-Chuan Wang, Shih-Ming Chang, Chih-Cheng Chin, Chi-Lun Lu, Angus S.J. Chin, Hung-Chang Hsieh, Shinn-Sheng Yu

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518041

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Image processing, Lithography, Image analysis, Image enhancement, Scanning electron microscopy, Photoresist processing, Logic

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Proceedings Article | 28 August 2003 Paper

Study of loading effect on dry etching process

Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin, Hong-Chang Hsieh

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504193

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photomasks, Optical lithography, Control systems, Manufacturing, Mask making, Cadmium, Inspection

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Showing 5 of 10 publications

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