Dr. Wolfgang Dettmann Profile

Dr. Wolfgang Dettmann

at Infineon Technologies AG

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 12 May 2005 Paper

OPC for double exposure lithography

Thorsten Winkler, Wolfgang Dettmann, Mario Hennig, Wolfram Koestler, Molela Moukara, Joerg Thiele, Karsten Zeiler

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599441

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Lithographic illumination, Optical lithography, Metals, Semiconducting wafers

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Proceedings Article | 2 June 2004 Paper

Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Rainer Pforr, Wolfgang Dettmann, M. Eisenhut, Mario Hennig, Detlef Hofmann, Joerg Thiele, Guido Thielscher

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568032

KEYWORDS: Manufacturing, Overlay metrology, Photomasks, Etching, Phase shifts, Scanners, Critical dimension metrology, Quartz, Mask making, Optical lithography

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Proceedings Article | 24 May 2004 Paper

Defect inspection of Quartz-PSMs: taking a leap forward

Jan Heumann, Frank Schurack, Wolfgang Dettmann, Larry Zurbrick, Michael Lang

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534057

KEYWORDS: Quartz, Inspection, Photomasks, Defect detection, Defect inspection, Phase shifts, Algorithm development, Semiconducting wafers, Detection and tracking algorithms, Lithography

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Proceedings Article | 28 August 2003 Paper

Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Wolfgang Dettmann, Jan Heumann, Tanja Hagner, Roderick Koehle, Stephen Rahn, Martin Verbeek, Mardjan Zarrabian, Jens Weckesser, Mario Hennig, Nicolo Morgana

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504202

KEYWORDS: Photomasks, Quartz, Inspection, Phase shifts, Defect inspection, Lithography, Semiconducting wafers, Scanning electron microscopy, Printing, Bridges

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Proceedings Article | 28 August 2003 Paper

Fourier analysis of AIMS images for mask characterization

Roderick Koehle, Wolfgang Dettmann, Martin Verbeek

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504216

KEYWORDS: Photomasks, Fourier transforms, Scanning electron microscopy, Image processing, Phase shifting, Image resolution, Raster graphics, Image analysis, Imaging systems, Sensors

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Proceedings Article | 26 June 2003 Paper

Full-level alternating PSM for sub-100nm DRAM gate patterning

Rainer Pforr, Marco Ahrens, Wolfgang Dettmann, Mario Hennig, Roderick Koehle, Burkhard Ludwig, Nicolo Morgana, Joerg Thiele

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485521

KEYWORDS: Critical dimension metrology, Photomasks, Optical lithography, Lithography, Optical proximity correction, Mask making, Phase shifts, Semiconducting wafers, Etching, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Image performance and mask characterization of 157-nm alternating phase-shifting mask

Yung-Tin Chen, Jeff Meute, Kim Dean, David Stark, Christof Schilz, Wolfgang Dettmann, Roderick Koehle, Bettina Schiessl, Wolfgang Degel

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485519

KEYWORDS: Photomasks, Etching, Critical dimension metrology, Semiconducting wafers, Phase shifts, Scanning electron microscopy, Phase measurement, Image processing, Image analysis, Monochromatic aberrations

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Proceedings Article | 27 December 2002 Paper

AltPSM inspection capability and printability of quartz defects

Jan Heumann, Mardjan Zarrabian, Mario Hennig, Wolfgang Dettmann, Larry Zurbrick, Michael Lang

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467498

KEYWORDS: Quartz, Photomasks, Inspection, Defect detection, Scanning electron microscopy, Defect inspection, Semiconducting wafers, Resolution enhancement technologies, Algorithm development, Phase shifts

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Proceedings Article | 1 August 2002 Paper

Alternating phase-shifting masks: phase determination and impact of quartz defects--theoretical and experimental results

Uwe Griesinger, Wolfgang Dettmann, Mario Hennig, Jan Heumann, Roderick Koehle, Ralf Ludwig, Martin Verbeek, Mardjan Zarrabian

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476982

KEYWORDS: Photomasks, Quartz, Inspection, Semiconducting wafers, Etching, Printing, Phase measurement, Scanning electron microscopy, Phase shifts, Lithography

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Proceedings Article | 30 July 2002 Paper

Introduction of full-level alternating phase-shift mask technology into IC manufacturing

Joerg Thiele, Marco Ahrens, Wolfgang Dettmann, M. Heissmeier, Mario Hennig, Burkhard Ludwig, Molela Moukara, Rainer Pforr

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474639

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Critical dimension metrology, Lithography, Phase shifts, Data modeling, Manufacturing, Optical calibration

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Proceedings Article | 5 September 2001 Paper

Defect printability study with programmed defects on halftone reticles

Wolfgang Dettmann, Henning Haffner, Jan Heumann, Roman Liebe, R. Ludwig, R. Moses

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438398

KEYWORDS: Photomasks, Scanning electron microscopy, Halftones, Semiconducting wafers, Printing, Inspection, Reticles, Image transmission, Phase shifts, Wafer-level optics

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Proceedings Article | 22 January 2001 Paper

Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification

Uwe Griesinger, Leonhard Mader, Armin Semmler, Wolfgang Dettmann, Christoph Noelscher, Rainer Pforr

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410714

KEYWORDS: Etching, Phase measurement, Photomasks, Phase shifts, Chromium, Calibration, 3D metrology, Quartz, Profiling, Error analysis

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Showing 5 of 12 publications

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