Mr. Won-Tai Ki Profile

Won-Tai Ki

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 4 December 2008 Paper

Paper

Optimization of mask manufacturing rule check constraint for model based assist feature generation

Seongbo Shim, Young-chang Kim, Yong-jin Chun, Seong-Woo Lee, Suk-joo Lee, Seong-woon Choi, Woo-sung Han, Seong-hoon Chang, Seok-chan Yoon, Hee-bom Kim, Won-tai Ki, Sang-gyun Woo, Han-gu Cho

Proceedings Volume 7140, 714030 (2008) https://doi.org/10.1117/12.804668

KEYWORDS: SRAF, Photomasks, Manufacturing, Semiconducting wafers, Image quality, Lithography, Optical proximity correction, Tolerancing, Critical dimension metrology, Optimization (mathematics)

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SRAF (sub-resolution assist feature) generation technology has been a popular resolution enhancement technique in photo-lithography past sub-65nm node. It helps to increase the process window, and these are some times called ILT(inverse lithography technology). Also, many studies have been presented on how to determine the best positions of SRAFs, and optimize its size. According to these reports, the generation of SRAF can be formulated as a constrained optimization problem. The constraints are the side lobe suppression and allowable minimum feature size or MRC (mask manufacturing rule check). As we know, bigger SRAF gives better contribution to main feature but susceptible to SRAF side lobe issue. Thus, we finally have no choice but to trade-off the advantages of the ideally optimized mask that contains very complicated SRAF patterns to the layout that has been MRC imposed applied to it. The above dilemma can be resolved by simultaneously using lower dose (high threshold) and cleaning up by smaller MRC. This solution makes the room between threshold (side lobe limitation) and MRC constraint (minimum feature limitation) wider. In order to use smaller MRC restriction without considering the mask writing and inspection issue, it is also appropriate to identify the exact mask writing limitation and find the smart mask constraints that well reflect the mask manufacturability and the e-beam lithography characteristics. In this article, we discuss two main topics on mask optimizations with SRAF. The first topic is on the experimental work to find what behavior of the mask writing ability is in term of several MRC parameters, and we propose more effective MRC constraint for aggressive generation of SRAF. The next topic is on finding the optimum MRC condition in practical case, 3X nm node DRAM contact layer. In fact, it is not easy to encompass the mask writing capability for very complicate real SRAF pattern by using the current MRC constraint based on the only width and space restriction. The test mask for this experimental work includes not only typical split patterns but also real device patterns that are generated by in-house model-based assist feature generation tool. We analyzed the mask writing result for typical patterns and compared the simulation result, and wafer result for real device patterns.

Proceedings Article | 19 May 2008 Paper

Paper

Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine

Won-Tai Ki, Ji-Hyeon Choi, Byung-Gook Kim, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 7028, 70280E (2008) https://doi.org/10.1117/12.793022

KEYWORDS: Forward error correction, Monte Carlo methods, Computer simulations, Photomasks, Convolution, Electron beam lithography, Cadmium sulfide, Vestigial sideband modulation, Double patterning technology, Dry etching

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Proceedings Article | 4 March 2008 Paper

Paper

Predicting conversion time of circuit design file by artificial neural networks

Sung-Hoon Jang, Jee-Hyong Lee, Byoung-Sup Ahn, Won-Tai Ki, Ji-Hyeon Choi, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 6925, 69250W (2008) https://doi.org/10.1117/12.771771

KEYWORDS: Data conversion, Neural networks, Photomasks, Data modeling, Statistical analysis, Error analysis, Neurons, Statistical modeling, Explosives, Artificial intelligence

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Proceedings Article | 20 October 2006 Paper

Paper

Load balancing using DP management server for commercial MDP software

Jong-Won Kim, Won-Tai Ki, Sung-Hoon Jang, Ji-Hyun Choi, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6349, 63493X (2006) https://doi.org/10.1117/12.686489

KEYWORDS: Manufacturing, Photomasks, Optical proximity correction, Resolution enhancement technologies, Semiconductors, Electronics, Data centers, Distributed computing, Network architectures, Local area networks

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Proceedings Article | 20 May 2006 Paper

Paper

Reduction of MDP time through the improvement of verification method

Young-Hwa Noh, Sung-Hoon Jang, Won-Tai Ki, Ji-Hyeon Choi, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, 62832N (2006) https://doi.org/10.1117/12.681800

KEYWORDS: Data conversion, Computed tomography, Photomasks, Double patterning technology, Lithography, Resolution enhancement technologies, Semiconductors, Electronics, Data centers, Critical dimension metrology

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Proceedings Article | 5 November 2005 Paper

Paper

Optimized distributed computing environment for mask data preparation

Byoung-Sup Ahn, Ju-Mi Bang, Min-Kyu Ji, Sun Kang, Sung-Hoon Jang, Yo-Han Choi, Won-Tai Ki, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 599214 (2005) https://doi.org/10.1117/12.632427

KEYWORDS: Optical proximity correction, Computing systems, Photomasks, Distributed computing, Manufacturing, Resolution enhancement technologies, Databases, Data conversion, Data storage, Silver

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Proceedings Article | 28 June 2005 Paper

Paper

Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Won-Tai Ki, Byung-Sup Ahn, Ji-Soong Park, Seung-Woon Choi, Sang-Back Ma, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617091

KEYWORDS: Photomasks, Chromium, Electron beam lithography, Double patterning technology, Computer simulations, Roentgenium, Semiconducting wafers, Factor analysis, Error analysis, Beam shaping

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Proceedings Article | 20 August 2004 Paper

Paper

Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Sung-Hoon Jang, Seung-Hune Yang, Byoung-Sup Ahn, Won-Tai Ki, Ji-Hyeon Choi, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557757

KEYWORDS: Photomasks, Critical dimension metrology, Modulation, Vestigial sideband modulation, Error analysis, Optical simulations, Electron beam lithography, Electron beams, Beam shaping, Data modeling

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Proceedings Article | 17 December 2003 Paper

Paper

Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator

Mi-Young Kim, Won-Tai Ki, Sung-Hoon Lee, Ji-Hyeon Choi, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518028

KEYWORDS: Monte Carlo methods, Critical dimension metrology, Electron beam lithography, Photomasks, Modulation, Scattering, Error analysis, Vestigial sideband modulation, Cadmium, Chemically amplified resists

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Proceedings Article | 26 June 2003 Paper

Paper

Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Jong Rak Park, Soon Ho Kim, Gi-Sung Yeo, Sung-Woon Choi, Won-Tai Ki, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485391

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Scanners, Transmittance, Optical lithography, Coating, Etching, Photoresist processing, Optical filters

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Proceedings Article | 27 December 2002 Paper

Paper

Manufacturability evaluation of model-based OPC masks

Sung-Hoon Jang, Sonny Zinn, Won-Tai Ki, Ji-Hyun Choi, Chan-Uk Jeon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, Yong-Ho Oh, Jai-Cheol Lee, Sungwoo Lim

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468093

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Manufacturing, Model-based design, Vestigial sideband modulation, Optical lithography, Semiconducting wafers, Data conversion, Computer simulations

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Proceedings Article | 22 January 2001 Paper

Paper

Analysis of photomask distortion caused by blank materials and open ratios

Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410697

KEYWORDS: Photomasks, Chromium, Distortion, Semiconducting wafers, Error analysis, Lithography, Scanners, Printing, Overlay metrology, Dry etching

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Proceedings Article | 22 January 2001 Paper

Paper

Effect of beam blur in mask fabrication

Seung-Hune Yang, Won-Tai Ki, Seong-Yong Moon, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410725

KEYWORDS: Beam shaping, Critical dimension metrology, Electron beams, Photoresist processing, Scanning electron microscopy, Optical simulations, Beam analyzers, Mask making, Convolution, Monte Carlo methods

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Proceedings Article | 19 July 2000 Paper

Paper

Dose latitude dependency on resist contrast in e-beam mask lithography

Byung-Cheol Cha, Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392058

KEYWORDS: Photoresist processing, Photomasks, Etching, Electron beam lithography, Beam shaping, Critical dimension metrology, Lithography, Dry etching, Gaussian beams, Scattering

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Proceedings Article | 30 December 1999 Paper

Paper

Analysis of photomask CD errors depending on development methods

Seong-Yong Moon, Won-Tai Ki, Byung-Cheol Cha, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373352

KEYWORDS: Critical dimension metrology, Photomasks, Error analysis, Liquids, Optical lithography, Coating, Semiconductors, Electronics, Lithography, Scattering

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Showing 5 of 15 publications

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