Dr. Yashesh A. Shroff Profile

Dr. Yashesh A. Shroff

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Publications (13)

Proceedings Article | 17 April 2014 Paper

AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature

Ryan Miyakawa, Xibin Zhou, Michael Goldstein, Dominic Ashworth, Kevin Cummings, Yu-Jen Fan, Yashesh Shroff, Greg Denbeaux, Yudhi Kandel, Patrick Naulleau

Proceedings Volume 9048, 90483A (2014) https://doi.org/10.1117/12.2048389

KEYWORDS: Artificial intelligence, Sensors, Reticles, Optical testing, Wavefronts, Wavefront sensors, Prototyping, Photomasks, Zernike polynomials, X-ray optics

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Proceedings Article | 28 March 2014 Paper

A frequency multiplication technique based on EUV near-field imaging

Yijian Chen, Yashesh Shroff

Proceedings Volume 9049, 90490D (2014) https://doi.org/10.1117/12.2045880

KEYWORDS: Near field, Extreme ultraviolet, Lithography, Near field optics, Tin, Extreme ultraviolet lithography, Wave propagation, Photomasks, Optical lithography, Critical dimension metrology

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Proceedings Article | 1 April 2013 Paper

In situ optical testing of exposure tools via localized wavefront curvature sensing

Ryan Miyakawa, Xibin Zhou, Michael Goldstein, Dominic Ashworth, Kevin Cummings, Yu-Jen Fan, Yashesh Shroff, Gregory Denbeaux, Yudhi Kandel, Patrick Naulleau

Proceedings Volume 8679, 86790Q (2013) https://doi.org/10.1117/12.2013880

KEYWORDS: Optical testing, Wavefronts, Condition numbers, Sensors, Reticles, Zernike polynomials, Interferometry, X-ray optics, Wavefront sensors, Photomasks

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Proceedings Article | 7 April 2011 Paper

CD correction for half pitch 2x-nm on extreme ultraviolet lithography

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Alan Myers, Yashesh Shroff, Tetsunori Murachi, Gilroy Vandentop, Ichiro Mori

Proceedings Volume 7969, 79691J (2011) https://doi.org/10.1117/12.878672

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Logic, Photomasks, Optical proximity correction, Model-based design, Lithography, Point spread functions, Electronic design automation

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Proceedings Article | 5 April 2011 Paper

EUVL alternating phase shift mask

Pei-Yang Yan, Alan Myers, Yashesh Shroff, Manish Chandhok, Guojing Zhang, Eric Gullikson, Farhad Salmassi

Proceedings Volume 7969, 79690G (2011) https://doi.org/10.1117/12.884790

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Binary data, Etching, Semiconducting wafers, Line width roughness, Phase shifts, Optical lithography, Printing, Image resolution

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Proceedings Article | 23 March 2010 Paper

Aerial image improvements on the Intel MET

Roman Caudillo, Todd Younkin, Steve Putna, Alan Myers, Yashesh Shroff, Terence Bacuita, Grant Kloster, Erik Sohmen

Proceedings Volume 7636, 76363I (2010) https://doi.org/10.1117/12.849142

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Photoresist materials, Semiconducting wafers, Printing, Modulation, Photomasks, Photoresist developing

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Proceedings Article | 24 March 2006 Paper

The effects of wafer-scan induced image blur on CD control, image slope, and process window in maskless lithography

Yijian Chen, Yashesh Shroff

Proceedings Volume 6151, 61512D (2006) https://doi.org/10.1117/12.655113

KEYWORDS: Semiconducting wafers, Maskless lithography, Line edge roughness, Extreme ultraviolet, Micromirrors, Coherence imaging, Lithography, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology

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Proceedings Article | 22 March 2006 Paper

EUV pellicle development for mask defect control

Yashesh Shroff, Michael Goldstein, Bryan Rice, Sang Lee, K. Ravi, Daniel Tanzil

Proceedings Volume 6151, 615104 (2006) https://doi.org/10.1117/12.656551

KEYWORDS: Pellicles, Silicon, Extreme ultraviolet, Ruthenium, Thin films, Reticles, Extreme ultraviolet lithography, Photomasks, Polymers, Oxidation

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Proceedings Article | 6 May 2005 Paper

Design and fabrication of tilting and piston micromirrors for maskless lithography

Yijian Chen, Chi Hui Chu, Yashesh Shroff, Jen-Shiang Wang, William Oldham

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599389

KEYWORDS: Micromirrors, Mirrors, Maskless lithography, Actuators, Extreme ultraviolet, Control systems, Nanolithography, Lithography, Photomasks, Deep ultraviolet

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Proceedings Article | 6 May 2005 Paper

Flare and lens aberration requirements for EUV lithographic tools

Sang Hun Lee, Yashesh Shroff, Manish Chandhok

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.604870

KEYWORDS: Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Control systems, Photomasks, Data modeling, Cadmium, Projection systems

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Proceedings Article | 20 May 2004 Paper

Layout decompression chip for maskless lithography

Borivoje Nikolic, Ben Wild, Vito Dai, Yashesh Shroff, Benjamin Warlick, Avideh Zakhor, William Oldham

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535878

KEYWORDS: Maskless lithography, Mirrors, Lithography, Semiconducting wafers, Simulink, Prototyping, Data compression, Photomasks, Interfaces, Micromirrors

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Proceedings Article | 20 May 2004 Paper

Image optimization for maskless lithography

Yashesh Shroff, Yijian Chen, William Oldham

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.548797

KEYWORDS: Mirrors, Modulation, Photomasks, Phase shift keying, Maskless lithography, Micromirrors, Image processing, Lithography, Printing, Tolerancing

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Proceedings Article | 16 June 2003 Paper

Optical analysis of mirror-based pattern generation

Yashesh Shroff, Yijian Chen, William Oldham

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484971

KEYWORDS: Mirrors, Nanoimprint lithography, Binary data, Photomasks, Semiconducting wafers, Image quality, Modulation, Analog electronics, Quality measurement, Coherence (optics)

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Showing 5 of 13 publications

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