Mr. Yasuyuki Kushida Profile

Yasuyuki Kushida

at Fujitsu Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 1 November 2007 Paper

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Yasuyuki Kushida, Hitoshi Handa, Hiroshi Maruyama, Yuuki Abe, Yukihiro Fujimura, Toshifumi Yokoyama

Proceedings Volume 6730, 673045 (2007) https://doi.org/10.1117/12.751244

KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

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Proceedings Article | 9 November 2005 Paper

Noble development system to achieve defect-free process for 65nm node photomasks

Hironori Sasaki, Shuichi Sanki, Ryugo Hikichi, Kiyoshi Ogawa, Akihiko Naito, Yukihiro Sato, Yasuyuki Kushida, Naoyuki Ishiwata, Hiroshi Maruyama

Proceedings Volume 5992, 59920M (2005) https://doi.org/10.1117/12.633668

KEYWORDS: Opacity, Photomasks, Photoresist processing, Inspection, Defect inspection, Dry etching, Semiconductors, Manufacturing, Scanning electron microscopy, Lithography

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Proceedings Article | 27 December 2002 Paper

Process bias control with thin Cr film blanks for 90-nm-node reticle fabrication

Yukihiro Sato, Hitoshi Handa, Yasuyuki Kushida, Satoru Asai, Hiroshi Maruyama, Yutaka Miyahara, Minoru Naito, Ryugo Hikichi, Yoji Kawasaki, Hiroyuki Miyashita, Shigeru Noguchi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467497

KEYWORDS: Etching, Chromium, Reticles, Thin films, Dry etching, Critical dimension metrology, Lithography, Semiconducting wafers, Process control, Control systems

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Proceedings Article | 19 July 2000 Paper

Improvement of ZEP process for advanced mask fabrication

Yasuyuki Kushida, Youichi Usui, Hisatsugu Shirai

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392063

KEYWORDS: Photomasks, Photoresist processing, Coating, Mask making, Critical dimension metrology, Ions, Chlorine, Etching, Chromium, Quartz

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Proceedings Article | 26 July 1999 Paper

Advanced resist coating technology for mask manufacturing process

Yasuyuki Kushida, Youichi Usui, Toru Kobayashi, Kazumasa Shigematsu

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354304

KEYWORDS: Coating, Photoresist processing, Manufacturing, Mask making, Chemically amplified resists, Electron beams, Coating equipment, Optical lithography, Quartz

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