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Yu-Lung Tung
at TSMC
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Publications (1)
Proceedings Article | 8 March 2016 Paper
A novel method to quantify the complex mask patterns
Yu-Lung Tung, Che-Yuan Sun, Shu-Chuan Chuang, Woei-Bin Luo, Jia-Rui Hu, Hsiang-Lin Chen, Hua-Tai Lin, Chih-Ming Ke, Tsai-Sheng Gau
Proceedings Volume 9778, 97783S (2016) https://doi.org/10.1117/12.2218346
KEYWORDS: Photomasks, Optical lithography, Critical dimension metrology, Optical proximity correction, Image processing, Process control, 193nm lithography, Lithography, Semiconductors, Performance modeling, Electron beam lithography, Mask making, Metrology
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