Dr. Yu-Po Tang Profile

Dr. Yu-Po Tang

at Synopsys Taiwan Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation

Advancing the curvilinear ILT and OPC ecosystem for low-k1 DUV and EUV lithography

Guangming Xiao, Kevin Hooker, Yunqiang Zhang, Ji Li, Thuc Dam, Yu-Po Tang, Linghui Wu, WooJoo Sim, Kevin Lucas

Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637

KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

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SPIE Journal Paper | 20 December 2023

Enhancing mask synthesis for curvilinear masks in full-chip extreme ultraviolet lithography

Kevin Hooker, Guangming Xiao, Yu-Po Tang, Yunqiang Zhang, Moongyu Jeong, John Valadez, Kevin Lucas

JM3, Vol. 22, Issue 04, 041606, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041606

KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Optical lithography, Machine learning, Extreme ultraviolet, Semiconducting wafers, Education and training, Industry, Source mask optimization

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SPIE Journal Paper | 24 November 2023

Curvilinear mask handling in OPC flow

Yung-Yu Chen, Kai-Hsiang Chang, Wen-Li Cheng, Yu-Po Tang

JM3, Vol. 23, Issue 01, 011203, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011203

KEYWORDS: Optical proximity correction, Shrinkage, Shape analysis, Visualization, Optical lithography, Nonlinear control, Manufacturing, Lithography, Industry, Histograms

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Proceedings Article | 28 April 2023 Presentation + Paper

Curvilinear mask handling in OPC flow

Yung-Yu Chen, Kai-Hsiang Chang, Wen-Li Cheng, Yu-Po Tang

Proceedings Volume 12495, 1249505 (2023) https://doi.org/10.1117/12.2663274

KEYWORDS: Optical proximity correction, Shrinkage, Nonlinear control, Histograms, Shape analysis, Model-based design, Lithography, Industry

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Proceedings Article | 16 September 2022 Paper

An optimized data prep flow for curvilinear masks

John Valadez, Yu-Po Tang, Mikhayil Mkrtchyan

Proceedings Volume 12325, 1232509 (2022) https://doi.org/10.1117/12.2640638

KEYWORDS: Photomasks, Data modeling, Lithography, Manufacturing, Extreme ultraviolet, Optical proximity correction, Tolerancing, Control systems, Databases

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