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Dr. Yveline Gobil
at CEA-LETI
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 15 July 2008 Paper
The development of x-ray bolometers based on SOI technology for astronomy
A. Aliane, F. De Moro, P. Agnese, C. Pigot, J.-L. Sauvageot, V. Szeflinski, A. Gasse, M. Arnaud, X. de la Broïse, X.-F. Navick, J. Routin, L. Mathieu, J.-C. Cigna, F. Berger, H. Ribot, Y. Gobil
Proceedings Volume 7011, 701125 (2008) https://doi.org/10.1117/12.784809
KEYWORDS: Silicon, Tantalum, Sensors, X-ray astronomy, X-rays, Indium, X-ray technology, Bolometers, Astronomy, Semiconducting wafers
Proceedings Article | 15 January 2003 Paper
Advanced dry etching for oxide deep trench
Yveline Gobil, Patrice Noel, Muriel Moreau, Marc van der Reijden
Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478280
KEYWORDS: Etching, Oxides, Photoresist materials, Chemistry, Polymers, Oxygen, Silicon, Photomasks, Carbon monoxide, Argon
Proceedings Article | 4 September 1998 Paper
Inorganic bottom ARC SiOxNy for interconnection levels on 0.18-um technology
Proceedings Volume 3508, (1998) https://doi.org/10.1117/12.324043
KEYWORDS: Reflectivity, Dielectrics, Critical dimension metrology, Interfaces, Metals, Silicon, Absorption, Copper, Lithography, Standards development
Proceedings Article | 29 June 1998 Paper
Inorganic bottom ARC SiOxNy for interconnection levels on 0.18-um technology
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312422
KEYWORDS: Reflectivity, Dielectrics, Interfaces, Metals, Silicon, Critical dimension metrology, Absorption, Copper, Lithography, Tungsten
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