Dr. Ankit Vora Profile

Dr. Ankit Vora

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SPIE Involvement:

Conference Program Committee | Author

Publications (4)

Proceedings Article | 13 June 2022 Presentation

Materials development for immersive augmented reality experiences

Ankit Vora, Nihar Mohanty, Keren Zhang, Giuseppe Calafiore, Tingling Rao, Heeyoon Lee, Geraud Dubois, Matthew Colburn

Proceedings Volume PC12055, PC1205506 (2022) https://doi.org/10.1117/12.2622524

KEYWORDS: Augmented reality, Glasses, Head-mounted displays, Refractive index, Optical lithography, Optical components, Nano optics, Head

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Proceedings Article | 25 March 2016 Paper

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication

HsinYu Tsai, Hiroyuki Miyazoe, Ankit Vora, Teddie Magbitang, Noel Arellano, Chi-Chun Liu, Michael Maher, William Durand, Simon Dawes, James Bucchignano, Lynne Gignac, Daniel Sanders, Eric Joseph, Matthew Colburn, C. Grant Willson, Christopher Ellison, Michael Guillorn

Proceedings Volume 9779, 977910 (2016) https://doi.org/10.1117/12.2219544

KEYWORDS: Line edge roughness, Line width roughness, Lithography, Polymers, Etching, Semiconductors, Manufacturing, Directed self assembly, Silicon, Plasma, Oxygen

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Proceedings Article | 21 March 2016 Paper

Contrast enhanced diffusion NMR: quantifying impurities in block copolymers for DSA

Rudy Wojtecki, Ellie Porath, Ankit Vora, Alshakim Nelson, Daniel Sanders

Proceedings Volume 9779, 977922 (2016) https://doi.org/10.1117/12.2218633

KEYWORDS: Diffusion, Polymers, Polymethylmethacrylate, Molecular self-assembly, Spectroscopy, Chromatography, Magnetism, Lithography, Adsorption, Liquids, Thin films, Picosecond phenomena, Polymerization, Rhodium, Carbonates

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Conference Committee Involvement (4)

Advances in Patterning Materials and Processes XLII

24 February 2025 | San Jose, California, United States

Advances in Patterning Materials and Processes XLI

26 February 2024 | San Jose, California, United States

Advances in Patterning Materials and Processes XL

27 February 2023 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIX

25 April 2022 | San Jose, California, United States

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