Industrial microsystems on top of CMOS design and process

Jordi Carrabina; Joaquin Saiz; David Marin; Xavier Marin; Angel Merlos; Joan Bausells

doi:10.1117/12.250717

17 September 1996 Industrial microsystems on top of CMOS design and process

Jordi Carrabina, Joaquin Saiz, David Marin, Xavier Marin, Angel Merlos, Joan Bausells

Proceedings Volume 2882, Micromachined Devices and Components II; (1996) https://doi.org/10.1117/12.250717
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States

Abstract

We propose a design and technology methodology and CAD tools for a microsystems fabrication based on the 1.0 micrometers CMOS from ATMEL-ES2. In order to profit from vendor cell libraries, design kits have to be enhanced to deal with the new conception environment. Main contributions are, sensor dependent technology file, device modeling and automatic generation for different ranges, and adaptation of semi- custom tools (simulation environment and P and R) for complete microsystems design. A library of dedicated sensor cells is being designed using Cadence DFWII and the foundry design kit. These sensors are fabricated with the standard CMOS process plus some post-processing steps. Three levels of post-processing are considered: 1) pH-ISFET sensors fabricated using standard CMOS, 2) gas flow and radiation sensors based on thermopiles using simple post-processing. The post-processing is compatible with the foundry CMOS process. Our technology has been developed up tot he point of maximum simplification that results in the use of only one additional mask for back-side etching. Passivation layer together with oxide windows are used for front-side etching with excellent results.

Citation Download Citation

Jordi Carrabina, Joaquin Saiz, David Marin, Xavier Marin, Angel Merlos, and Joan Bausells "Industrial microsystems on top of CMOS design and process", Proc. SPIE 2882, Micromachined Devices and Components II, (17 September 1996); https://doi.org/10.1117/12.250717

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