Scissionable bile acid nanostructures for lithography

Robert P. Meagley; Geeta Sharma; Ankur Guptab

doi:10.1117/12.712355

19 March 2007 Scissionable bile acid nanostructures for lithography

Robert P. Meagley, Geeta Sharma, Ankur Guptab

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171J (2007) https://doi.org/10.1117/12.712355
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Pixelated photoresists, i.e. resists that compartmentalize photochemistry into discrete imaging elements are an emerging design for improved resolution. A pixelated design seeks to overcome chaotic organization in complex resist formulations through application of small regular or symmetric imaging species, and/or through the application of preorganization of resist components. [1] Another approach, backbone scission, has also emerged as a powerful method to improve resist performance. [2] In this approach, the parts of the resist structure that have undergone radiation driven chemistry are disconnected from the unaffected material. This enhances contrast and also confers an additional mechanism: structural disruption. Bile acids have been used recently as building blocks to enable host-guest chemistry [3] and have been incorporated as additives in photoresists [4] and structural elements [5]. They as a class are fairly large (mw ~400) highly functionalized molecules possessing a hydrophobic face, alcohol groups and a carboxylic acid group. We describe here a scissionable pixelated resist architecture based on bile acids bound by acid-sensitive tertiary ester linkages into dendrimeric arrays. This design seeks to employ structural disintegration and catalyst pre-organization in addition to solubility switching as contrast mechanisms. Preliminary EUV and ebeam studies have shown G0 and G1 materials capable of sub-micron imaging.

Citation Download Citation

Robert P. Meagley, Geeta Sharma, and Ankur Guptab "Scissionable bile acid nanostructures for lithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171J (19 March 2007); https://doi.org/10.1117/12.712355

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Dendrimers

Molecules

Photoresist materials

Lithography

Polymers

Analog electronics

Chemical elements

Show All Keywords

Keywords/Phrases

Search In:

Publication Years