High-localized nanolithography based on high-precision nanopositioning and nanomeasuring machines

Eberhard Manske; Ivo W. Rangelow; Jaqueline Stauffenberg; Thomas Kissinger; Ingo Ortlepp; Thomas Fröhlich; Denis Dontsov; Alexander Reum

doi:10.1117/12.2658705

30 April 2023 High-localized nanolithography based on high-precision nanopositioning and nanomeasuring machines

Eberhard Manske, Ivo W. Rangelow, Jaqueline Stauffenberg, Thomas Kissinger, Ingo Ortlepp, Thomas Fröhlich, Denis Dontsov, Alexander Reum

Author Affiliations +

Proceedings Volume PC12497, Novel Patterning Technologies 2023; PC124970A (2023) https://doi.org/10.1117/12.2658705
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Most new nanolithography techniques are demonstrated over very mall working areas. An important milestone was reached at the TU Ilmenau with the development of a 4-inch nanofabrication and nanomeasuring machine, which is equipped with a special SPL/AFM head. The advanced interferometric air-bearing stage allows an exorbitant resolution of 20 picometres within the full range of 4 inch. A very high structuring accuracy is achieved. The tip-based lithography process based on Fowler-Nordheim electron field emission results in immediate patterning with very small line widths. In the paper, the exceptionally high measurement and fabrication accuracy will be comprehensively presented and discussed.

Conference Presentation

Citation Download Citation

Eberhard Manske, Ivo W. Rangelow, Jaqueline Stauffenberg, Thomas Kissinger, Ingo Ortlepp, Thomas Fröhlich, Denis Dontsov, and Alexander Reum "High-localized nanolithography based on high-precision nanopositioning and nanomeasuring machines", Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC124970A (30 April 2023); https://doi.org/10.1117/12.2658705

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