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18 June 2024 Spatial atomic layer deposition: a new revolution in ultra-fast production of conformal oxide-based optical coatings
John-Olof Rönn, Sauli Virtanen, Philipp Maydannik, Kalle Niiranen, Sami Sneck
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Proceedings Volume PC13020, Advances in Optical Thin Films VIII; PC1302005 (2024) https://doi.org/10.1117/12.3017093
Event: SPIE Optical Systems Design, 2024, Strasbourg, France
Abstract
In this work, we present a new-generation atomic layer deposition (ALD) technology that revolutionizes the production of conformal optical coatings: the spatial ALD. In spatial ALD, the substrate is rotated across successive process zones to achieve ultra-fast, high-precision and conformal thin film deposition. We present our latest results obtained with our novel C2R spatial ALD system, including the fabrication of SiO2, Ta2O5, Al2O3 and TiO2 with deposition rates reaching > 1 µm/h. We also show that these materials exhibit low surface roughness (<1 Å RMS), low optical loss (<10 ppm @ 1064 nm) and excellent uniformity (< 2% over 200 mm)
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John-Olof Rönn, Sauli Virtanen, Philipp Maydannik, Kalle Niiranen, and Sami Sneck "Spatial atomic layer deposition: a new revolution in ultra-fast production of conformal oxide-based optical coatings", Proc. SPIE PC13020, Advances in Optical Thin Films VIII, PC1302005 (18 June 2024); https://doi.org/10.1117/12.3017093
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KEYWORDS
Atomic layer deposition
Optical coatings
Ultrafast phenomena
Thin films
Thin film deposition
Optical properties
Silica
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