Paper
29 June 1984 Multiple Layer Techniques In Optical Lithography: Applications To Fine Line Mos Production
M A Listvan, M. Swanson, A. Wall, S A. Campbell
Author Affiliations +
Abstract
The theory and practical concerns of multi-layer techniques using an anti-reflective polymer coating will be discussed. Anti Reflective Coating (ARC, Brewer Science, Inc.) was incorporated into the metal lithography process for a 1.2 micron gate CMOS prototype production line. Previously, reflections from substrate topography had caused a loss in linewidth control. These reflections were minimized by the ARC, which also restored process latitude. For the process described, ARC coating uniformity was ± nm, adhesion was good, and step coverage was seen to be adequate to 0.8 micron high verticle wall steps.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M A Listvan, M. Swanson, A. Wall, and S A. Campbell "Multiple Layer Techniques In Optical Lithography: Applications To Fine Line Mos Production", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941894
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CITATIONS
Cited by 3 scholarly publications and 2 patents.
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KEYWORDS
Metals

Semiconducting wafers

Photoresist materials

Coating

Optical lithography

Prototyping

Critical dimension metrology

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