A 10:1 Photomask Reduction Camera

Katalin Voros; Pantas Sutardja; William G. Oldham

doi:10.1117/12.963734

20 August 1986 A 10:1 Photomask Reduction Camera

Katalin Voros, Pantas Sutardja, William G. Oldham

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963734
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

To make high quality reticles for 1:1 projection steppers a new 10:1 reduction camera had been designed and built. Components of the camera, the illuminator and controller are described and operating conditions to print patterns of 0.75 μm lines and spaces are established. Optical and mechanical characterization results are presented.

Citation Download Citation

Katalin Voros, Pantas Sutardja, and William G. Oldham "A 10:1 Photomask Reduction Camera", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963734

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