Damage Resistance And Crystal Growth Of KDP

John F Cooper; Mary F Singleton

doi:10.1117/12.939610

9 March 1987 Damage Resistance And Crystal Growth Of KDP

John F Cooper, Mary F Singleton

Proceedings Volume 0681, Laser and Nonlinear Optical Materials; (1987) https://doi.org/10.1117/12.939610
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

An investigation is reported of the dependence of laser-damage site density on fluence and on various parameters of crystal growth and post-growth treatment. Damage site density (number of defects per unit volume) was found to increase monotonically with fluence (for single 1-ns pulses of 1.06 μm laser light). Site density (at a fluence of 10 J/cm2) was influenced by solution flow rate, seed defect removal prior to growth, quaternary ammonium cations, and thermal cycling following growth. No dependence of damage susceptibility on growth rate was found over the range 3-30 mm/d. A model is presented which postulates the electrostatic adsorption cf organic material onto the growing crystal surface and subsequent inclusion into the crystal. According to the model, damage occurs by absorption of light by inclusions of solution-wetted organic debris, resulting in pressure increase and hydraulic fracture of the surrounding crystal.

Citation Download Citation

John F Cooper and Mary F Singleton "Damage Resistance And Crystal Growth Of KDP", Proc. SPIE 0681, Laser and Nonlinear Optical Materials, (9 March 1987); https://doi.org/10.1117/12.939610

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