An Advanced Wafer Stepper For Sub-Micron Fabrication

Herbert E. Mayer; Ernst W. Loebach

doi:10.1117/12.975607

17 September 1987 An Advanced Wafer Stepper For Sub-Micron Fabrication

Herbert E. Mayer, Ernst W. Loebach

Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975607
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands

Abstract

An advanced wafer stepper is presented addressing the specific problems involved by sub-micron lithography such as alignment and focusing to multilayer resist films. New sub-systems were developed while maintaining principles well proven in a previous design. The system is described emphasizing the new sub-systems, and performance data are presented.

Citation Download Citation

Herbert E. Mayer and Ernst W. Loebach "An Advanced Wafer Stepper For Sub-Micron Fabrication", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); https://doi.org/10.1117/12.975607

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