Optical Thickness Monitoring Of Dielectric Optical Filters Using A New In-Situ Photometer With High Signal Resolution And Excellent Long-Term-Stability

Alfons Zoller; Michael Boos; Reinhard Herrmann; Werner Klug; Walter Lehnert

doi:10.1117/12.950024

27 February 1989 Optical Thickness Monitoring Of Dielectric Optical Filters Using A New In-Situ Photometer With High Signal Resolution And Excellent Long-Term-Stability

Alfons Zoller, Michael Boos, Reinhard Herrmann, Werner Klug, Walter Lehnert

Author Affiliations +

Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950024
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

We will describe the concept and operation principle of the newly developed monochromatic process photometer OMS 3000 for optical coating systems. It is designed as a true double beam instrument, completely controlled by modern microprocessor techniques. It offers high signal resolution and excellent long-term stability. The deposition of complicated layer systems is supported by an advanced monitoring software which precalculates the cut-off conditions. In addition, spectral measurements between layers are possible allowing the on-line-optimization via an external host computer.

Citation Download Citation

Alfons Zoller, Michael Boos, Reinhard Herrmann, Werner Klug, and Walter Lehnert "Optical Thickness Monitoring Of Dielectric Optical Filters Using A New In-Situ Photometer With High Signal Resolution And Excellent Long-Term-Stability", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950024

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