Proximity-compensated kinoforms directly written by e-beam lithography

M. Larsson; Mats Ekberg; Fredrik K. Nikolajeff; Sverker Hard; Paul D. Maker; Richard E. Muller

doi:10.1117/12.170197

28 December 1993 Proximity-compensated kinoforms directly written by e-beam lithography

M. Larsson, Mats Ekberg, Fredrik K. Nikolajeff, Sverker Hard, Paul D. Maker, Richard E. Muller

Proceedings Volume 10271, Diffractive and Miniaturized Optics: A Critical Review; 1027109 (1993) https://doi.org/10.1117/12.170197
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Proximity-compensated kinoforms were manufactured with direct-writing electron-beam lithography in two different resists, SAL 110 and PMMA. The kinoforms were blazed transmission gratings, with periods 4, 8, 16 pm 1 mm by 1 mm size, and a Fresnel lens, with 38 mm focal length and 3 mm by 3 mm size. The compensated gratings performed better than the uncompensated ones: for the 4 pm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The Fresnel lens had diffraction limited optical performance with better than 85% efficiency. The compensation was made by repeated convolutions in the spatial domain or deconvolution in the Fourier domain using the electron-beam point-spread function.

We also present developing processes for PMMA and SAL 110 resists that are more appropriate for multilevel resist kinoforms manufactured with direct-write electron-beam lithography.

Citation Download Citation

M. Larsson, Mats Ekberg, Fredrik K. Nikolajeff, Sverker Hard, Paul D. Maker, and Richard E. Muller "Proximity-compensated kinoforms directly written by e-beam lithography", Proc. SPIE 10271, Diffractive and Miniaturized Optics: A Critical Review, 1027109 (28 December 1993); https://doi.org/10.1117/12.170197

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